TY - JOUR
T1 - Defect formation in single layer graphene under extreme ultraviolet irradiation
AU - Gao, An
AU - Zoethout, E.
AU - Sturm, Jacobus Marinus
AU - Lee, Christopher James
AU - Bijkerk, Frederik
PY - 2014
Y1 - 2014
N2 - We study extreme ultraviolet (EUV) radiation induced defects in single-layer graphene. Two mechanisms for inducing defects in graphene were separately investigated: photon induced chemical reactions between graphene and background residual gases, and breaking sp2 bonds, due to photon and/or photoelectrons induced bond cleaving. Raman spectroscopy shows that D peak intensities grow after EUV irradiation with increasing water partial pressure in the exposure chamber. Temperature-programmed desorption (TPD) experiments prove that EUV radiation results in water dissociation on the graphene surface. The oxidation of graphene, caused by water dissociation, is triggered by photon and/or photoelectron induced dissociation of water. Our studies show that the EUV photons break the sp2 bonds, forming sp3 bonds, leading to defects in graphene.
AB - We study extreme ultraviolet (EUV) radiation induced defects in single-layer graphene. Two mechanisms for inducing defects in graphene were separately investigated: photon induced chemical reactions between graphene and background residual gases, and breaking sp2 bonds, due to photon and/or photoelectrons induced bond cleaving. Raman spectroscopy shows that D peak intensities grow after EUV irradiation with increasing water partial pressure in the exposure chamber. Temperature-programmed desorption (TPD) experiments prove that EUV radiation results in water dissociation on the graphene surface. The oxidation of graphene, caused by water dissociation, is triggered by photon and/or photoelectron induced dissociation of water. Our studies show that the EUV photons break the sp2 bonds, forming sp3 bonds, leading to defects in graphene.
KW - IR-93252
KW - METIS-307248
U2 - 10.1016/j.apsusc.2014.08.177
DO - 10.1016/j.apsusc.2014.08.177
M3 - Article
VL - 317
SP - 745
EP - 751
JO - Applied surface science
JF - Applied surface science
SN - 0169-4332
ER -