Dependency of Dishing on Polish Time and Slurry Chemistry in Cu-CMP

V. Nguyen Hoang, H. van Kranenburg, P.H. Woerlee

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationEuropean Workshop Materials for Advanced Metallization
    Place of PublicationOostende, Belgium
    Number of pages2
    Publication statusPublished - 8 Mar 1999


    • METIS-113904

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