Deposition of High-Quality SiO2 Insulating Films at Low Temperatures by means of Remote PECVD

A. Boogaard, R. Roesthuis, I. Brunets, Antonius A.I. Aarnink, Alexeij Y. Kovalgin, J. Holleman, Robertus A.M. Wolters, Jurriaan Schmitz

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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