Determination of oxygen diffusion kinetics during thin film ruthenium oxidation

R. Coloma Ribera; R.W.E. van de Kruijs; A.E. Yakshin; F. Bijkerk

doi:10.1063/1.4928295

Determination of oxygen diffusion kinetics during thin film ruthenium oxidation

R. Coloma Ribera^*, R.W.E. van de Kruijs, A.E. Yakshin, F. Bijkerk

^*Corresponding author for this work

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

In situ X-ray reflectivity was used to reveal oxygen diffusion kinetics for thermal oxidation of polycrystalline ruthenium thin films and accurate determination of activation energies for this process. Diffusion rates in nanometer thin RuO2 films were found to show Arrhenius behaviour. However, a gradual decrease in diffusion rates was observed with oxide growth, with the activation energy increasing from about 2.1 to 2.4 eV. Further exploration of the Arrhenius pre-exponential factor for diffusion process revealed that oxidation of polycrystalline ruthenium joins the class of materials that obey the Meyer-Neldel rule.

Original language	English
Article number	055303
Number of pages	5
Journal	Journal of Applied Physics
Volume	118
Issue number	5
Early online date	6 Aug 2015
DOIs	https://doi.org/10.1063/1.4928295
Publication status	Published - 7 Aug 2015

Keywords

METIS-311081
IR-96663
Microfabrication
Polycrystalline material
Thin films
Oxides
Transition metals
Chemical elements
Activation energies
Diffusion rate
Pre-exponential factor
X-ray
reflectivity
2023 OA procedure

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title = "Determination of oxygen diffusion kinetics during thin film ruthenium oxidation",

abstract = "In situ X-ray reflectivity was used to reveal oxygen diffusion kinetics for thermal oxidation of polycrystalline ruthenium thin films and accurate determination of activation energies for this process. Diffusion rates in nanometer thin RuO2 films were found to show Arrhenius behaviour. However, a gradual decrease in diffusion rates was observed with oxide growth, with the activation energy increasing from about 2.1 to 2.4 eV. Further exploration of the Arrhenius pre-exponential factor for diffusion process revealed that oxidation of polycrystalline ruthenium joins the class of materials that obey the Meyer-Neldel rule.",

keywords = "METIS-311081, IR-96663, Microfabrication, Polycrystalline material, Thin films, Oxides, Transition metals, Chemical elements, Activation energies, Diffusion rate, Pre-exponential factor, X-ray, reflectivity, 2023 OA procedure",

author = "{Coloma Ribera}, R. and {van de Kruijs}, R.W.E. and A.E. Yakshin and F. Bijkerk",

year = "2015",

month = aug,

day = "7",

doi = "10.1063/1.4928295",

language = "English",

volume = "118",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

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T1 - Determination of oxygen diffusion kinetics during thin film ruthenium oxidation

AU - Coloma Ribera, R.

AU - van de Kruijs, R.W.E.

AU - Yakshin, A.E.

AU - Bijkerk, F.

PY - 2015/8/7

Y1 - 2015/8/7

N2 - In situ X-ray reflectivity was used to reveal oxygen diffusion kinetics for thermal oxidation of polycrystalline ruthenium thin films and accurate determination of activation energies for this process. Diffusion rates in nanometer thin RuO2 films were found to show Arrhenius behaviour. However, a gradual decrease in diffusion rates was observed with oxide growth, with the activation energy increasing from about 2.1 to 2.4 eV. Further exploration of the Arrhenius pre-exponential factor for diffusion process revealed that oxidation of polycrystalline ruthenium joins the class of materials that obey the Meyer-Neldel rule.

AB - In situ X-ray reflectivity was used to reveal oxygen diffusion kinetics for thermal oxidation of polycrystalline ruthenium thin films and accurate determination of activation energies for this process. Diffusion rates in nanometer thin RuO2 films were found to show Arrhenius behaviour. However, a gradual decrease in diffusion rates was observed with oxide growth, with the activation energy increasing from about 2.1 to 2.4 eV. Further exploration of the Arrhenius pre-exponential factor for diffusion process revealed that oxidation of polycrystalline ruthenium joins the class of materials that obey the Meyer-Neldel rule.

KW - METIS-311081

KW - IR-96663

KW - Microfabrication

KW - Polycrystalline material

KW - Thin films

KW - Oxides

KW - Transition metals

KW - Chemical elements

KW - Activation energies

KW - Diffusion rate

KW - Pre-exponential factor

KW - X-ray

KW - reflectivity

KW - 2023 OA procedure

U2 - 10.1063/1.4928295

DO - 10.1063/1.4928295

M3 - Article

SN - 0021-8979

VL - 118

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 5

M1 - 055303

ER -

Determination of oxygen diffusion kinetics during thin film ruthenium oxidation

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Keywords

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