Abstract
This paper presents a technique to determine the Young’s modulus and residual stress of thin films using a simple micromachined silicon cantilever as the test structure. An analytical relation was developed based on the shift in
resonance frequency caused by the addition of a thin film on the cantilever. FEM simulations were performed which confirmed the validity of assumptions made in our analytical model.
Resonance frequency measurements both before and after the deposition of the thin film improve the accuracy of the results. Experiments were performed on PZT deposited by pulsed laser deposition and on evaporated Co80Ni20 thin films.
Original language | Undefined |
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Title of host publication | Proceedings of the 20th Micromechanics Europe Workshop |
Place of Publication | Toulouse |
Publisher | LAAS-CNRS |
Pages | 278-281 |
Number of pages | 4 |
ISBN (Print) | not assigned |
Publication status | Published - 2009 |
Event | 20th Micromechanics Europe Workshop, MME 2009 - Toulouse, France Duration: 21 Sep 2009 → 23 Sep 2009 Conference number: 20 |
Publication series
Name | |
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Publisher | LAAS-CNRS |
Conference
Conference | 20th Micromechanics Europe Workshop, MME 2009 |
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Abbreviated title | MME |
Country/Territory | France |
City | Toulouse |
Period | 21/09/09 → 23/09/09 |
Keywords
- METIS-264014
- Cantilever
- IR-68054
- CoNi
- EWI-16040
- Resonance frequency
- Young’s modulus
- TST-SMI: Formerly in EWI-SMI
- TST-uSPAM: micro Scanning Probe Array Memory
- PZT