Developing reflective multilayer coatings, an enabling component of Extreme Ultraviolet Lithography

Research output: Contribution to conferencePosterOther research output

Original languageEnglish
Pages-
Publication statusPublished - 24 Sep 2010
Event7th International Conference on Thin Films and Applications (TFA) - Shanghai, China
Duration: 24 Sep 201027 Sep 2010

Conference

Conference7th International Conference on Thin Films and Applications (TFA)
CityShanghai, China
Period24/09/1027/09/10

Keywords

  • METIS-270316

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