Developing reflective multilayer coatings, an enabling component of Extreme Ultraviolet Lithography

Research output: Contribution to conference › Poster › Other research output

Original language	English
Pages	-
Publication status	Published - 24 Sept 2010
Event	7th International Conference on Thin Films and Applications (TFA) - Shanghai, China Duration: 24 Sept 2010 → 27 Sept 2010

Conference	7th International Conference on Thin Films and Applications (TFA)
City	Shanghai, China
Period	24/09/10 → 27/09/10

Keywords

@conference{ae25339383fd49a69a92ba844cde0dca,

title = "Developing reflective multilayer coatings, an enabling component of Extreme Ultraviolet Lithography",

keywords = "METIS-270316",

author = "Eric Louis and S. Muellender and Frederik Bijkerk",

year = "2010",

month = sep,

day = "24",

language = "English",

pages = "--",

note = "7th International Conference on Thin Films and Applications (TFA) ; Conference date: 24-09-2010 Through 27-09-2010",

}