Developments for broadband spectral and spatial characterization of tin plasma light sources for EUV lithography

Zoi Bouza

Research output: ThesisPhD Thesis - Research external, graduation external

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Abstract

This Thesis explored the spectral and spatial characteristics of laser-driven plasma sources of EUV light. The work reported in this Thesis mainly focused on the out-of-band radiation produced by tin laser-produced plasma, in contrast to most of the available literature – which covers mostly the wavelength range close to the in-band radiation near 13.5 nm. Out-of-band radiation can provide key insights into the production of EUV light, and is by itself of particular interest as certain wavelength ranges may be detrimental to the lithography processes. For our work, we carefully calibrated the intensity response of a transmission grating spectrometer and added novel imaging capabilities to the spectrometer.
Original languageEnglish
QualificationDoctor of Philosophy
Awarding Institution
  • Amsterdam UMC-Location Vrije Universiteit
Supervisors/Advisors
  • Versolato, Oscar, Supervisor, External person
  • Ubachs, Wim, Supervisor, External person
  • Hoekstra, R.A. , Supervisor, External person
  • Bayraktar, Muharrem, Co-Supervisor
Award date6 Oct 2023
Place of PublicationAmsterdam
Publisher
Print ISBNs978-94-6469-500-7
Publication statusPublished - 6 Oct 2023
Externally publishedYes

Keywords

  • EUV
  • Plasma processes

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