Dielectric Behavior of Self-Assembled Monolayers on Conducting Metal Oxides

O. Yildirim, M.G. Maas, P.J. de Veen, Duc Minh Nguyen, David Reinhoudt, David H.A. Blank, Augustinus J.H.M. Rijnders, Jurriaan Huskens

Research output: Contribution to journalArticleAcademicpeer-review

1 Citation (Scopus)

Abstract

Pt top contacts have been deposited by pulsed laser deposition (PLD) onto bare and tetradecylphosphate (TDP) self-assembled monolayer (SAM)-modified Nb-doped SrTiO3 (Nb-STO) substrates. For the SAM-modified substrates, electrochemical Cu deposition occurred only at the places where electrical shorts existed between the top contact and the substrate. A nearly perfect yield of top contacts without shorts was obtained, which shows the dense packing and robustness of the SAM. The SAM decreased the leakage current about 500 times compared to the bare substrate. Alkylphosphate SAMs on conducting metal oxide substrates can therefore be used as dielectric thin films for device fabrication.
Original languageEnglish
Pages (from-to)2405-2409
Number of pages5
JournalJournal of materials chemistry
Volume22
Issue number6
DOIs
Publication statusPublished - 2012

Keywords

  • METIS-288498
  • IR-79732

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