Our recent results on planar and channel waveguide fabrication and lasers in the dielectric oxide materials Ti:sapphire and rare-earth-ion-doped potassium yttrium double tungstate (KYW) are reviewed. We have employed waveguide fabrication methods such as liquid phase epitaxy and reactive ion etching as well as ion beam implantation and femtosecond laser writing. We have obtained surface and buried channel waveguide lasers in Ti:sapphire near 800 nm and planar waveguide lasers in KYW:Yb near 1 µm and KYW:Tm near 2 µm.
|Name||Proceedings of SPIE|
|Conference||International Conference on Lasers, Applications, and Technologies 2007: Advanced Laser Systems|
|Period||28/05/07 → 1/06/07|
|Other||28 May - 1 June 2007|
- IOMS-APD: Active Photonic Devices