Dimensional Control in Corner Lithography for Wafer-Scale Fabrication of Nano-Apertures

Narges Burouni; Erwin Berenschot; Miko Elwenspoek; Niels Tas

doi:10.1109/NEMS.2011.6017509

Dimensional Control in Corner Lithography for Wafer-Scale Fabrication of Nano-Apertures

Narges Burouni
, Erwin Berenschot
, Miko Elwenspoek
, Niels Tas

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

3 Citations (Scopus)

18 Downloads (Pure)

Abstract

In this paper we investigate a new method to fabricate 3D-oriented nanostructures in wafer scale, and apply it to fabricate a nano-apertures at the apex of a pyramid. A number of new technologies require the use of apertures to serve as electrical, nano fluidic or optical probes. Controlling the size of the aperture is one of the key problems in fabrication process. Our approach is based on corner lithography and offers wafer scale control of the size of the aperture in diameters less than 1µm. We show how to control the size of the nano-aperture by timed isotropic etching of silicon nitride, which serves as a mask for the aperture formation.

Original language	English
Title of host publication	6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011
Place of Publication	Piscataway, NJ
Publisher	IEEE
Pages	940-943
Number of pages	4
ISBN (Electronic)	978-1-61284-777-1
ISBN (Print)	978-1-61284-775-7
DOIs	https://doi.org/10.1109/NEMS.2011.6017509
Publication status	Published - 20 Feb 2011
Event	6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011 - Kaohsiung, Taiwan Duration: 20 Feb 2011 → 23 Feb 2011 Conference number: 6

Conference

Conference	6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011
Abbreviated title	NEMS
Country/Territory	Taiwan
City	Kaohsiung
Period	20/02/11 → 23/02/11

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

METIS-278726
3-D
IR-78098
Corner Lithography
EWI-20292
Nanofabrication
LOCOS
Silicon nitride
Nanoaperture

Access to Document

10.1109/NEMS.2011.6017509

Cite this

@inproceedings{24af157984ea45318d0e131285359a93,

title = "Dimensional Control in Corner Lithography for Wafer-Scale Fabrication of Nano-Apertures",

abstract = "In this paper we investigate a new method to fabricate 3D-oriented nanostructures in wafer scale, and apply it to fabricate a nano-apertures at the apex of a pyramid. A number of new technologies require the use of apertures to serve as electrical, nano fluidic or optical probes. Controlling the size of the aperture is one of the key problems in fabrication process. Our approach is based on corner lithography and offers wafer scale control of the size of the aperture in diameters less than 1µm. We show how to control the size of the nano-aperture by timed isotropic etching of silicon nitride, which serves as a mask for the aperture formation.",

keywords = "METIS-278726, 3-D, IR-78098, Corner Lithography, EWI-20292, Nanofabrication, LOCOS, Silicon nitride, Nanoaperture",

author = "Narges Burouni and Erwin Berenschot and Miko Elwenspoek and Niels Tas",

year = "2011",

month = feb,

day = "20",

doi = "10.1109/NEMS.2011.6017509",

language = "English",

isbn = "978-1-61284-775-7",

pages = "940--943",

booktitle = "6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011",

publisher = "IEEE",

address = "United States",

note = "6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, NEMS ; Conference date: 20-02-2011 Through 23-02-2011",

}

Burouni, N, Berenschot, E, Elwenspoek, M & Tas, N 2011, Dimensional Control in Corner Lithography for Wafer-Scale Fabrication of Nano-Apertures. in 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011. IEEE, Piscataway, NJ, pp. 940-943, 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, Kaohsiung, Taiwan, 20/02/11. https://doi.org/10.1109/NEMS.2011.6017509

Dimensional Control in Corner Lithography for Wafer-Scale Fabrication of Nano-Apertures. / Burouni, Narges; Berenschot, Erwin; Elwenspoek, Miko et al.
6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011. Piscataway, NJ: IEEE, 2011. p. 940-943.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Dimensional Control in Corner Lithography for Wafer-Scale Fabrication of Nano-Apertures

AU - Burouni, Narges

AU - Berenschot, Erwin

AU - Elwenspoek, Miko

AU - Tas, Niels

N1 - Conference code: 6

PY - 2011/2/20

Y1 - 2011/2/20

N2 - In this paper we investigate a new method to fabricate 3D-oriented nanostructures in wafer scale, and apply it to fabricate a nano-apertures at the apex of a pyramid. A number of new technologies require the use of apertures to serve as electrical, nano fluidic or optical probes. Controlling the size of the aperture is one of the key problems in fabrication process. Our approach is based on corner lithography and offers wafer scale control of the size of the aperture in diameters less than 1µm. We show how to control the size of the nano-aperture by timed isotropic etching of silicon nitride, which serves as a mask for the aperture formation.

AB - In this paper we investigate a new method to fabricate 3D-oriented nanostructures in wafer scale, and apply it to fabricate a nano-apertures at the apex of a pyramid. A number of new technologies require the use of apertures to serve as electrical, nano fluidic or optical probes. Controlling the size of the aperture is one of the key problems in fabrication process. Our approach is based on corner lithography and offers wafer scale control of the size of the aperture in diameters less than 1µm. We show how to control the size of the nano-aperture by timed isotropic etching of silicon nitride, which serves as a mask for the aperture formation.

KW - METIS-278726

KW - 3-D

KW - IR-78098

KW - Corner Lithography

KW - EWI-20292

KW - Nanofabrication

KW - LOCOS

KW - Silicon nitride

KW - Nanoaperture

U2 - 10.1109/NEMS.2011.6017509

DO - 10.1109/NEMS.2011.6017509

M3 - Conference contribution

SN - 978-1-61284-775-7

SP - 940

EP - 943

BT - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011

PB - IEEE

CY - Piscataway, NJ

T2 - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011

Y2 - 20 February 2011 through 23 February 2011

ER -

Dimensional Control in Corner Lithography for Wafer-Scale Fabrication of Nano-Apertures

Abstract

Conference

UN SDGs

Keywords

Access to Document

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Cite this