Direct Laser Writing Photonic Applications

Research output: Contribution to conferencePosterAcademic

Abstract

We investigate the fabrication quality of direct laser writing (DLW), quantifying how fabrication errors and deviations from design are affecting the optical response of photonic scattering structures. Furthermore, we have materialized light phase static masks as passive wavefront control applications. Finally, we investigate creation of elements of photonic circuits (waveguide design and free-standing photonic wiring) for state of the art photonic applications.
Original languageEnglish
Publication statusPublished - 19 Apr 2018
Event2nd MESA+ NanoLab cleanroom user meeting 2018 - The Gallery, University of Twente, Enschede, Netherlands
Duration: 19 Apr 201819 Apr 2018
https://www.utwente.nl/mesaplus/archive/!/2018/4/265507/mesa-nanolab-cleanroom-user-meeting-2018

Conference

Conference2nd MESA+ NanoLab cleanroom user meeting 2018
Country/TerritoryNetherlands
CityEnschede
Period19/04/1819/04/18
Internet address

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