The possibilities to grow isolated structures of complex oxides by pulsed laser deposition through stencils were investigated. A stencil consisting of a SiN membrane with apertures of several hundred nanometers embedded in a Si chip is placed in front of a heated substrate (up to 750 degrees Celsius). Deposition through these apertures results in resistless, direct patterning by local deposition of complex oxides like ferroelectric Lead Zirconate Titanate. The created isolated structures were analyzed by AFM imaging. Under-deposition, in this work called broadening, is inevitable during stencil deposition and is depending on deposition parameters, especially pressure. Different causes of broadening are mapped and discussed.
|Number of pages||4|
|Journal||Journal of physics: Conference series|
|Publication status||Published - 2007|
|Event||8th International Conference on Laser Ablation, COLA 2005 - Banff, Canada|
Duration: 11 Sep 2005 → 16 Sep 2005
Conference number: 8
- EC Grant Agreement nr.: FP6/500120