Direct patterning of complex oxides by pulsed laser deposition through stencils

Paul te Riele; Arjen Janssens; Guus Rijnders; Dave H.A. Blank

doi:10.1088/1742-6596/59/1/086

Direct patterning of complex oxides by pulsed laser deposition through stencils

Paul te Riele, Arjen Janssens, Guus Rijnders, Dave H.A. Blank

Research output: Contribution to journal › Conference article › Academic › peer-review

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Abstract

The possibilities to grow isolated structures of complex oxides by pulsed laser deposition through stencils were investigated. A stencil consisting of a SiN membrane with apertures of several hundred nanometers embedded in a Si chip is placed in front of a heated substrate (up to 750 degrees Celsius). Deposition through these apertures results in resistless, direct patterning by local deposition of complex oxides like ferroelectric Lead Zirconate Titanate. The created isolated structures were analyzed by AFM imaging. Under-deposition, in this work called broadening, is inevitable during stencil deposition and is depending on deposition parameters, especially pressure. Different causes of broadening are mapped and discussed.

Original language	English
Pages (from-to)	404-407
Number of pages	4
Journal	Journal of physics: Conference series
Volume	59
DOIs	https://doi.org/10.1088/1742-6596/59/1/086
Publication status	Published - 2007
Event	8th International Conference on Laser Ablation, COLA 2005 - Banff, Canada Duration: 11 Sept 2005 → 16 Sept 2005 Conference number: 8

Keywords

EC Grant Agreement nr.: FP6/500120

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10.1088/1742-6596/59/1/086Licence: CC BY

TeRiele2007directFinal published version, 209 KBLicence: CC BY

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title = "Direct patterning of complex oxides by pulsed laser deposition through stencils",

abstract = "The possibilities to grow isolated structures of complex oxides by pulsed laser deposition through stencils were investigated. A stencil consisting of a SiN membrane with apertures of several hundred nanometers embedded in a Si chip is placed in front of a heated substrate (up to 750 degrees Celsius). Deposition through these apertures results in resistless, direct patterning by local deposition of complex oxides like ferroelectric Lead Zirconate Titanate. The created isolated structures were analyzed by AFM imaging. Under-deposition, in this work called broadening, is inevitable during stencil deposition and is depending on deposition parameters, especially pressure. Different causes of broadening are mapped and discussed.",

keywords = "EC Grant Agreement nr.: FP6/500120",

author = "{te Riele}, Paul and Arjen Janssens and Guus Rijnders and Blank, {Dave H.A.}",

year = "2007",

doi = "10.1088/1742-6596/59/1/086",

language = "English",

volume = "59",

pages = "404--407",

journal = "Journal of physics: Conference series",

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publisher = "Institute of Physics (IOP)",

note = "8th International Conference on Laser Ablation, COLA 2005, COLA ; Conference date: 11-09-2005 Through 16-09-2005",

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TY - JOUR

T1 - Direct patterning of complex oxides by pulsed laser deposition through stencils

AU - te Riele, Paul

AU - Janssens, Arjen

AU - Rijnders, Guus

AU - Blank, Dave H.A.

N1 - Conference code: 8

PY - 2007

Y1 - 2007

N2 - The possibilities to grow isolated structures of complex oxides by pulsed laser deposition through stencils were investigated. A stencil consisting of a SiN membrane with apertures of several hundred nanometers embedded in a Si chip is placed in front of a heated substrate (up to 750 degrees Celsius). Deposition through these apertures results in resistless, direct patterning by local deposition of complex oxides like ferroelectric Lead Zirconate Titanate. The created isolated structures were analyzed by AFM imaging. Under-deposition, in this work called broadening, is inevitable during stencil deposition and is depending on deposition parameters, especially pressure. Different causes of broadening are mapped and discussed.

AB - The possibilities to grow isolated structures of complex oxides by pulsed laser deposition through stencils were investigated. A stencil consisting of a SiN membrane with apertures of several hundred nanometers embedded in a Si chip is placed in front of a heated substrate (up to 750 degrees Celsius). Deposition through these apertures results in resistless, direct patterning by local deposition of complex oxides like ferroelectric Lead Zirconate Titanate. The created isolated structures were analyzed by AFM imaging. Under-deposition, in this work called broadening, is inevitable during stencil deposition and is depending on deposition parameters, especially pressure. Different causes of broadening are mapped and discussed.

KW - EC Grant Agreement nr.: FP6/500120

U2 - 10.1088/1742-6596/59/1/086

DO - 10.1088/1742-6596/59/1/086

M3 - Conference article

SN - 1742-6588

VL - 59

SP - 404

EP - 407

JO - Journal of physics: Conference series

JF - Journal of physics: Conference series

T2 - 8th International Conference on Laser Ablation, COLA 2005

Y2 - 11 September 2005 through 16 September 2005

ER -

Direct patterning of complex oxides by pulsed laser deposition through stencils

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