Direct Patterning of Covalent Organic Monolayers on Silicon Using Nanoimprint Lithography

W. Pim Voorthuijzen, M.D. Yilmaz, A. Gomez Casado, Pascal Jonkheijm, Wilfred Gerard van der Wiel, Jurriaan Huskens

Research output: Contribution to journalArticleAcademicpeer-review

10 Citations (Scopus)

Abstract

Two fabrication schemes are reported for the direct patterning of organic monolayers on oxide-free silicon, combining top-down nanoimprint lithography and bottom-up monolayer formation. The first approach was designed to form monolayer patterns on the imprinted areas, while the second approach was designed for monolayer formation outside of the imprinted features. By both approaches, covalently bonded Si-C monolayer patterns with feature sizes ranging from 100 nm to 100 μm were created via a hydrosilylation procedure using diluted reagents. Both unfunctionalized and ω-functionalized alkenes were patterned successfully.
Original languageEnglish
Pages (from-to)14210-14215
Number of pages6
JournalLangmuir
Volume26
Issue number17
DOIs
Publication statusPublished - 10 Aug 2010

Keywords

  • EWI-19131
  • IR-75556
  • METIS-274010

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