Direct Patterning of Oxides by Pulsed Laser Stencil Deposition

P.M. te Riele

Research output: ThesisPhD Thesis - Research UT, graduation UT

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Abstract

This thesis describes a detailed study of the application of stencil technology in the patterning of epitaxial oxide thin films by pulsed laser deposition (PLD). Stencil patterning has been applied in thin film sub-micron patterning of metals successfully for decades since it has several advantages over lithography techniques. It is a single processing step technique which can be applied to many different types of surfaces. The stencil patterning process does not utilize any solvents which makes it a favored technique for patterning metals on fragile and/or organic materials. However, for successful stencil patterning and unlimited (re)use of stencils, several issues need to be solved. The main issues that limit the re-usability of stencils are clogging of the apertures and deformation of the stencil caused by stress induced by the deposited material.
Original languageEnglish
Awarding Institution
  • University of Twente
Supervisors/Advisors
  • Blank, D.H.A., Supervisor
  • Rijnders, Guus, Advisor
Award date11 Sep 2008
Place of PublicationZutphen
Publisher
Print ISBNs978-90-365-2709-5
Publication statusPublished - 11 Sep 2008

Keywords

  • METIS-250703
  • IR-59468
  • EC Grant Agreement nr.: FP6/500120

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    te Riele, P. M. (2008). Direct Patterning of Oxides by Pulsed Laser Stencil Deposition. Zutphen: Wöhrmann Print Service.