Dislocation engineering for silicon devices

J.S. Custer, J.R. Liefting, R.J. Schreutelkamp, R.C.M. Wijburg, Hans Wallinga, F.W. Saris

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of the 1992 International Conference on Solid State Devices and Materials
    Place of PublicationTsukuba, Japan
    Pages38-39
    Number of pages0
    Publication statusPublished - 26 Aug 1992

    Keywords

    • METIS-113928

    Cite this

    Custer, J. S., Liefting, J. R., Schreutelkamp, R. J., Wijburg, R. C. M., Wallinga, H., & Saris, F. W. (1992). Dislocation engineering for silicon devices. In Proceedings of the 1992 International Conference on Solid State Devices and Materials (pp. 38-39). Tsukuba, Japan.