Distributed field plate effects in split-gate trench MOSFETs

R. Tambone*, A. Ferrara, F. Magrini, A. Hoffmann, A. Wood, G. Noebauer, E. Gondro, R. J.E. Hueting

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)
17 Downloads (Pure)

Abstract

Fast electric transients can cause distributed effects inside trench MOSFETs possibly resulting in device failure. A new test structure to study those distributed effects, combined with a new Transmission-Line Pulse (TLP) setup, is presented. On-wafer TLP measurements are performed and combined with TCAD and SPICE simulations to predict the space and time evolution of the field plate potential during transients.

Original languageEnglish
Title of host publication2023 35th International Conference on Microelectronic Test Structure, ICMTS 2023
PublisherIEEE
ISBN (Electronic)9798350346534
DOIs
Publication statusPublished - 10 Apr 2023
Event35th International Conference on Microelectronic Test Structure, ICMTS 2023 - Tokyo, Japan
Duration: 27 Mar 202330 Mar 2023
Conference number: 35

Publication series

NameIEEE International Conference on Microelectronic Test Structures
Volume2023-March

Conference

Conference35th International Conference on Microelectronic Test Structure, ICMTS 2023
Abbreviated titleICMTS 2023
Country/TerritoryJapan
CityTokyo
Period27/03/2330/03/23

Keywords

  • 2024 OA procedure
  • Field plate
  • MOSFET
  • Split-gate
  • TCAD
  • Test structure
  • TLP
  • Distributed effects

Fingerprint

Dive into the research topics of 'Distributed field plate effects in split-gate trench MOSFETs'. Together they form a unique fingerprint.

Cite this