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Dopant profile engineering of advanced Si MOSFET's using ion implantation
P.A. Stolk, Y.V. Ponomarev, J. Schmitz, A.C.M.C. van Brandenburg, R. Roes, A.H. Montree, P.H. Woerlee
Research output: Contribution to journal › Article › Academic › peer-review
7
Citations
(Scopus)