Double layer imprint lithography on wafers and foils from the sub-micron to the mm scale

P. Moonen, I. Yakimets, M. Péter, E.R. Meinders, Jurriaan Huskens

Research output: Contribution to journalArticleAcademicpeer-review

4 Citations (Scopus)
Original languageEnglish
Pages (from-to)1041-1048
Number of pages8
JournalACS applied materials & interfaces
Volume3
Publication statusPublished - 2011

Keywords

  • METIS-282165

Cite this

Moonen, P. ; Yakimets, I. ; Péter, M. ; Meinders, E.R. ; Huskens, Jurriaan. / Double layer imprint lithography on wafers and foils from the sub-micron to the mm scale. In: ACS applied materials & interfaces. 2011 ; Vol. 3. pp. 1041-1048.
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year = "2011",
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journal = "ACS applied materials & interfaces",
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Double layer imprint lithography on wafers and foils from the sub-micron to the mm scale. / Moonen, P.; Yakimets, I.; Péter, M.; Meinders, E.R.; Huskens, Jurriaan.

In: ACS applied materials & interfaces, Vol. 3, 2011, p. 1041-1048.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Double layer imprint lithography on wafers and foils from the sub-micron to the mm scale

AU - Moonen, P.

AU - Yakimets, I.

AU - Péter, M.

AU - Meinders, E.R.

AU - Huskens, Jurriaan

PY - 2011

Y1 - 2011

KW - METIS-282165

M3 - Article

VL - 3

SP - 1041

EP - 1048

JO - ACS applied materials & interfaces

JF - ACS applied materials & interfaces

SN - 1944-8244

ER -