ECR plasma deposited SiO2 and Si3N4 layers: a room temperature technology

Gratiela Ileana Isai

    Research output: ThesisPhD Thesis - Research UT, graduation UT

    34 Downloads (Pure)

    Fingerprint Dive into the research topics of 'ECR plasma deposited SiO<sub>2</sub> and Si<sub>3</sub>N<sub>4</sub> layers: a room temperature technology'. Together they form a unique fingerprint.

    Physics & Astronomy