Edge Transfer Lithography Using Alkanethiol Inks

R.B.A. Sharpe; Bram J.F. Titulaer; Emiel Peeters; Dirk Burdinski; Jurriaan Huskens; Henricus J.W. Zandvliet; David Reinhoudt; Bene Poelsema

doi:10.1021/nl0607885

Edge Transfer Lithography Using Alkanethiol Inks

R.B.A. Sharpe, Bram J.F. Titulaer, Emiel Peeters, Dirk Burdinski, Jurriaan Huskens, Henricus J.W. Zandvliet, David Reinhoudt, Bene Poelsema

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.

Original language	Undefined
Pages (from-to)	1235-1239
Number of pages	5
Journal	Nano letters
Volume	6
Issue number	6
DOIs	https://doi.org/10.1021/nl0607885
Publication status	Published - 2006

Keywords

METIS-232779
IR-59488

Access to Document

10.1021/nl0607885

Cite this

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title = "Edge Transfer Lithography Using Alkanethiol Inks",

abstract = "Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.",

keywords = "METIS-232779, IR-59488",

author = "R.B.A. Sharpe and Titulaer, {Bram J.F.} and Emiel Peeters and Dirk Burdinski and Jurriaan Huskens and Zandvliet, {Henricus J.W.} and David Reinhoudt and Bene Poelsema",

year = "2006",

doi = "10.1021/nl0607885",

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TY - JOUR

T1 - Edge Transfer Lithography Using Alkanethiol Inks

AU - Sharpe, R.B.A.

AU - Titulaer, Bram J.F.

AU - Peeters, Emiel

AU - Burdinski, Dirk

AU - Huskens, Jurriaan

AU - Zandvliet, Henricus J.W.

AU - Reinhoudt, David

AU - Poelsema, Bene

PY - 2006

Y1 - 2006

N2 - Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.

AB - Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.

KW - METIS-232779

KW - IR-59488

U2 - 10.1021/nl0607885

DO - 10.1021/nl0607885

M3 - Article

SN - 1530-6984

VL - 6

SP - 1235

EP - 1239

JO - Nano letters

JF - Nano letters

IS - 6

ER -