Edge Transfer Lithography Using Alkanethiol Inks

R.B.A. Sharpe, Bram J.F. Titulaer, Emiel Peeters, Dirk Burdinski, Jurriaan Huskens, Henricus J.W. Zandvliet, David Reinhoudt, Bene Poelsema

Research output: Contribution to journalArticleAcademicpeer-review

35 Citations (Scopus)

Abstract

Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.
Original languageUndefined
Pages (from-to)1235-1239
Number of pages5
JournalNano letters
Volume6
Issue number6
DOIs
Publication statusPublished - 2006

Keywords

  • METIS-232779
  • IR-59488

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