Effect of colloidal substrate curvature on pH-responsive polyelectrolyte brush growth

Benjamin T. Cheesman, Alexander J G Neilson, Joshua D. Willott, Grant B. Webber, Steve Edmondson, Erica J. Wanless

Research output: Contribution to journalArticleAcademicpeer-review

23 Citations (Scopus)

Abstract

Coatings consisting of polymer brushes are an effective way to modify solid interfaces. Polymer brush-modified hybrid particles have been prepared by surface-initiated activators regenerated by electron transfer atom transfer radical polymerization (SI-ARGET ATRP) of 2-(diethylamino)ethyl methacrylate (DEA) on silica particles. We have optimized the synthesis with respect to changing the reducing agent, temperature, and reaction solvent from an aqueous ethanol mixture to an aqueous methanol mixture. Our flexible electrostatically adsorbed macroinitiator approach allows for the modification of a variety of surfaces. Polybasic brushes have been grown on silica particles of different sizes, from 120 to 840 nm in diameter, as well as on wafers, and a comparison of the products has allowed the effect of surface curvature to be elucidated. An examination of the thickness of the dry brush and the aqueous hydrodynamic brush at both pH 7 and at 4 demonstrated that growth increased substantially with substrate curvature for particles with a diameter below 450 nm. This is attributed to the increasing separation between active chain ends, reducing the rate of termination. This is believed to be the first time that this effect has been demonstrated experimentally. Furthermore, we have seen that polymer brush growth on planar wafers was significantly reduced when the reaction mixture was stirred.

Original languageEnglish
Pages (from-to)6131-6140
Number of pages10
JournalLangmuir
Volume29
Issue number20
DOIs
Publication statusPublished - 21 May 2013
Externally publishedYes

Fingerprint

brushes
Brushes
Polyelectrolytes
curvature
Substrates
Polymers
Silicon Dioxide
polymers
Silica
wafers
silicon dioxide
Methacrylates
Atom transfer radical polymerization
Reducing Agents
Reducing agents
Methanol
electron transfer
Ethanol
ethyl alcohol
Hydrodynamics

Cite this

Cheesman, B. T., Neilson, A. J. G., Willott, J. D., Webber, G. B., Edmondson, S., & Wanless, E. J. (2013). Effect of colloidal substrate curvature on pH-responsive polyelectrolyte brush growth. Langmuir, 29(20), 6131-6140. https://doi.org/10.1021/la4004092
Cheesman, Benjamin T. ; Neilson, Alexander J G ; Willott, Joshua D. ; Webber, Grant B. ; Edmondson, Steve ; Wanless, Erica J. / Effect of colloidal substrate curvature on pH-responsive polyelectrolyte brush growth. In: Langmuir. 2013 ; Vol. 29, No. 20. pp. 6131-6140.
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Cheesman, BT, Neilson, AJG, Willott, JD, Webber, GB, Edmondson, S & Wanless, EJ 2013, 'Effect of colloidal substrate curvature on pH-responsive polyelectrolyte brush growth' Langmuir, vol. 29, no. 20, pp. 6131-6140. https://doi.org/10.1021/la4004092

Effect of colloidal substrate curvature on pH-responsive polyelectrolyte brush growth. / Cheesman, Benjamin T.; Neilson, Alexander J G; Willott, Joshua D.; Webber, Grant B.; Edmondson, Steve; Wanless, Erica J.

In: Langmuir, Vol. 29, No. 20, 21.05.2013, p. 6131-6140.

Research output: Contribution to journalArticleAcademicpeer-review

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Cheesman BT, Neilson AJG, Willott JD, Webber GB, Edmondson S, Wanless EJ. Effect of colloidal substrate curvature on pH-responsive polyelectrolyte brush growth. Langmuir. 2013 May 21;29(20):6131-6140. https://doi.org/10.1021/la4004092