Effect of gas pressure on properties of FePt film sputtered on polymer substrate

L.T. Nguyen, A. Lisfi, J.C. Lodder

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    Abstract

    FePt thin films ~70 nm thick! have been prepared by dc sputtering under a variable Ar pressure (4x10-3-4x10-2 mb) and have been annealed at temperatures ranging from 300 to 400 °C. With increasing Ar pressure, the ordering process requires a lower annealing temperature. However, further increase of Ar pressure deteriorates the crystallinity of the film which hinders the transformation from fcc to fct structure. The structural analyses show a strong correlation between the ordering process and the microstructure.
    Original languageEnglish
    Pages (from-to)7492-7494
    Number of pages3
    JournalJournal of Applied Physics
    Volume95
    Issue number11
    DOIs
    Publication statusPublished - 2004

    Keywords

    • SMI-TST: From 2006 in EWI-TST
    • SMI-MAT: MATERIALS

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