Effect of hydrogen on surface of niobium

V.J. Gadgil, E.G. Keim

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

Niobium single crystals are used as substrate material for constructing superconducting quantum interference device or SQUID. The use of niobium is prompted by the fact that it is a low Tc metallic superconductor. In order to fabricate the device the surface of the crystal has to be polished flat. This is achieved by combination of mechanical polishing and electrochemical polishing. It has been reported that during electrochemical polishing hydrogen can enter the material forming Niobium hydrides. These can result in surface roughening of a magnitude greater than the thickness of the films subsequently deposited. This leads to failure of the films. The problem can be solved by annealing the material at 300° C to remove any hydrogen that might be present. However it is phenomenologically interesting to study the effect of electrochemical hydrogen charging on the surface of Niobium.
Original languageEnglish
Title of host publicationHydrogen in Semiconductors and Metals
Subtitle of host publicationsymposium held april 13-17, 1998, San Francisco, California, USA
EditorsNorbert H. Nickel, Warren B. Jackson
PublisherMaterials Research Society
Pages49-53
Number of pages5
ISBN (Print)1-55899-419-X
DOIs
Publication statusPublished - 1 Jan 1998
EventHydrogen in Semiconductors and Metals 1998 - San Francisco, United States
Duration: 13 Apr 199814 Apr 1998

Publication series

NameMaterials Research Society symposium proceedings
PublisherMaterials Research Society
Volume513

Conference

ConferenceHydrogen in Semiconductors and Metals 1998
CountryUnited States
CitySan Francisco
Period13/04/9814/04/98

Keywords

  • METIS-130364

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