Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

Research output: Contribution to conferencePosterOther research output

Abstract

Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.
Original languageEnglish
Pages-
Publication statusPublished - 28 Sep 2015
EventMESA+ Meeting 2015 - University of Twente, Enschede, Netherlands
Duration: 28 Sep 201528 Sep 2015
https://www.utwente.nl/mesaplus/meeting/archive/program 2015/

Conference

ConferenceMESA+ Meeting 2015
CountryNetherlands
CityEnschede
Period28/09/1528/09/15
Other(MESA+ Day/Dag)
Internet address

Fingerprint

modulus of elasticity
graphene
reticles
protective coatings
beam splitters
tensile strength
thermal conductivity
lithography
gratings
pumps
membranes
probes
thin films

Keywords

  • METIS-313098

Cite this

Mund, B. K., Gao, A., Sturm, J. M., Lee, C. J., & Bijkerk, F. (2015). Elastic modulus of Extreme Ultraviolet exposed single-layer graphene. -. Poster session presented at MESA+ Meeting 2015, Enschede, Netherlands.
Mund, Baibhav Kumar ; Gao, An ; Sturm, Jacobus Marinus ; Lee, Christopher James ; Bijkerk, Frederik. / Elastic modulus of Extreme Ultraviolet exposed single-layer graphene. Poster session presented at MESA+ Meeting 2015, Enschede, Netherlands.
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Mund, BK, Gao, A, Sturm, JM, Lee, CJ & Bijkerk, F 2015, 'Elastic modulus of Extreme Ultraviolet exposed single-layer graphene' MESA+ Meeting 2015, Enschede, Netherlands, 28/09/15 - 28/09/15, pp. -.

Elastic modulus of Extreme Ultraviolet exposed single-layer graphene. / Mund, Baibhav Kumar; Gao, An; Sturm, Jacobus Marinus; Lee, Christopher James; Bijkerk, Frederik.

2015. - Poster session presented at MESA+ Meeting 2015, Enschede, Netherlands.

Research output: Contribution to conferencePosterOther research output

TY - CONF

T1 - Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

AU - Mund, Baibhav Kumar

AU - Gao, An

AU - Sturm, Jacobus Marinus

AU - Lee, Christopher James

AU - Bijkerk, Frederik

PY - 2015/9/28

Y1 - 2015/9/28

N2 - Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.

AB - Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.

KW - METIS-313098

M3 - Poster

SP - -

ER -

Mund BK, Gao A, Sturm JM, Lee CJ, Bijkerk F. Elastic modulus of Extreme Ultraviolet exposed single-layer graphene. 2015. Poster session presented at MESA+ Meeting 2015, Enschede, Netherlands.