Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

Baibhav Kumar Mund; An Gao; Jacobus Marinus Sturm; Christopher James Lee; Frederik Bijkerk

Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

Baibhav Kumar Mund, An Gao, Jacobus Marinus Sturm, Christopher James Lee, Frederik Bijkerk

XUV Optics

Research output: Contribution to conference › Poster › Other research output

Abstract

Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.

Original language	English
Pages	-
Publication status	Published - 6 Sep 2015
Event	Ameland Workshop 2015 - Netherlands, Ameland Duration: 6 Sep 2015 → 11 Sep 2015

Conference

Conference	Ameland Workshop 2015
City	Netherlands, Ameland
Period	6/09/15 → 11/09/15

Keywords

METIS-313097

Access to Document

http://www.rug.nl/research/zernike/news/otherevents/ameland2015/

Cite this

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title = "Elastic modulus of Extreme Ultraviolet exposed single-layer graphene",

abstract = "Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.",

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author = "Mund, {Baibhav Kumar} and An Gao and Sturm, {Jacobus Marinus} and Lee, {Christopher James} and Frederik Bijkerk",

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T1 - Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

AU - Mund, Baibhav Kumar

AU - Gao, An

AU - Sturm, Jacobus Marinus

AU - Lee, Christopher James

AU - Bijkerk, Frederik

PY - 2015/9/6

Y1 - 2015/9/6

N2 - Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.

AB - Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.

KW - METIS-313097

M3 - Poster

SP - -

T2 - Ameland Workshop 2015

Y2 - 6 September 2015 through 11 September 2015

ER -

Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

Abstract

Conference

Keywords

Access to Document

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Cite this