Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

Baibhav Kumar Mund; An Gao; Jacobus Marinus Sturm; Christopher James Lee; Frederik Bijkerk

Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

Baibhav Kumar Mund, An Gao, Jacobus Marinus Sturm, Christopher James Lee, Frederik Bijkerk

XUV Optics

Research output: Contribution to conference › Poster › Other research output

Abstract

Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.

Original language	English
Pages	-
Publication status	Published - 31 Aug 2015
Event	31st European Conference on Surface Science, ECOSS 2015 - Barcelona, Spain Duration: 31 Aug 2015 → 4 Sep 2015 Conference number: 31

Conference

Conference	31st European Conference on Surface Science, ECOSS 2015
Abbreviated title	ECOSS-31
Country	Spain
City	Barcelona
Period	31/08/15 → 4/09/15

Keywords

METIS-313095

Access to Document

http://ecoss2015.org/

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Cite this

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title = "Elastic modulus of Extreme Ultraviolet exposed single-layer graphene",

abstract = "Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.",

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author = "Mund, {Baibhav Kumar} and An Gao and Sturm, {Jacobus Marinus} and Lee, {Christopher James} and Frederik Bijkerk",

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AU - Mund, Baibhav Kumar

AU - Gao, An

AU - Sturm, Jacobus Marinus

AU - Lee, Christopher James

AU - Bijkerk, Frederik

N1 - Conference code: 31

PY - 2015/8/31

Y1 - 2015/8/31

N2 - Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.

AB - Highly transparent membranes are required for a number of applications, such as protective coatings for components in Extreme Ultraviolet (EUV) lithography, beam splitters (EUV pump-probe experiments), transmission gratings, and reticles. Graphene is an excellent candidate due to its high tensile strength, thermal conductivity and EUV transmission. Also, graphene is relatively chemically inert, as compared to other thin films currently available.

KW - METIS-313095

M3 - Poster

SP - -

T2 - 31st European Conference on Surface Science, ECOSS 2015

Y2 - 31 August 2015 through 4 September 2015

ER -