Electrical and thermal simulation of local effects for electromigration

M. Borgarino, V. Petrescu, L. Brizzolara, I. de Munari, F. Fantini

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    1 Citation (Scopus)

    Abstract

    The aim of this work is to investigate the distribution of the local current density and temperature gradients along the test patterns employed for the evaluation of the electromigration phenomena in metal tracks. The impact of the line shape is taken into account. The investigation has been performed by means of a 2D simulator based on a FEM solver.
    Original languageEnglish
    Pages (from-to)1369-1377
    Number of pages9
    JournalSemiconductor science and technology
    Volume12
    Issue number11
    DOIs
    Publication statusPublished - 1997

    Keywords

    • METIS-112008
    • IR-96396

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  • Cite this

    Borgarino, M., Petrescu, V., Brizzolara, L., de Munari, I., & Fantini, F. (1997). Electrical and thermal simulation of local effects for electromigration. Semiconductor science and technology, 12(11), 1369-1377. https://doi.org/10.1088/0268-1242/12/11/008