Electrical and thermal simulation of local effects for electromigration

M. Borgarino; V. Petrescu; L. Brizzolara; I. de Munari; F. Fantini

doi:10.1088/0268-1242/12/11/008

Electrical and thermal simulation of local effects for electromigration

M. Borgarino
, V. Petrescu
, L. Brizzolara
, I. de Munari
, F. Fantini

Research output: Contribution to journal › Article › Academic › peer-review

1 Citation (Scopus)

2 Downloads (Pure)

Abstract

The aim of this work is to investigate the distribution of the local current density and temperature gradients along the test patterns employed for the evaluation of the electromigration phenomena in metal tracks. The impact of the line shape is taken into account. The investigation has been performed by means of a 2D simulator based on a FEM solver.

Original language	English
Pages (from-to)	1369-1377
Number of pages	9
Journal	Semiconductor science and technology
Volume	12
Issue number	11
DOIs	https://doi.org/10.1088/0268-1242/12/11/008
Publication status	Published - 1997

Keywords

METIS-112008
IR-96396

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10.1088/0268-1242/12/11/008

Cite this

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title = "Electrical and thermal simulation of local effects for electromigration",

abstract = "The aim of this work is to investigate the distribution of the local current density and temperature gradients along the test patterns employed for the evaluation of the electromigration phenomena in metal tracks. The impact of the line shape is taken into account. The investigation has been performed by means of a 2D simulator based on a FEM solver.",

keywords = "METIS-112008, IR-96396",

author = "M. Borgarino and V. Petrescu and L. Brizzolara and \{de Munari\}, I. and F. Fantini",

year = "1997",

doi = "10.1088/0268-1242/12/11/008",

language = "English",

volume = "12",

pages = "1369--1377",

journal = "Semiconductor science and technology",

issn = "0268-1242",

publisher = "Institute of Physics (IOP)",

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TY - JOUR

T1 - Electrical and thermal simulation of local effects for electromigration

AU - Borgarino, M.

AU - Petrescu, V.

AU - Brizzolara, L.

AU - de Munari, I.

AU - Fantini, F.

PY - 1997

Y1 - 1997

N2 - The aim of this work is to investigate the distribution of the local current density and temperature gradients along the test patterns employed for the evaluation of the electromigration phenomena in metal tracks. The impact of the line shape is taken into account. The investigation has been performed by means of a 2D simulator based on a FEM solver.

AB - The aim of this work is to investigate the distribution of the local current density and temperature gradients along the test patterns employed for the evaluation of the electromigration phenomena in metal tracks. The impact of the line shape is taken into account. The investigation has been performed by means of a 2D simulator based on a FEM solver.

KW - METIS-112008

KW - IR-96396

U2 - 10.1088/0268-1242/12/11/008

DO - 10.1088/0268-1242/12/11/008

M3 - Article

SN - 0268-1242

VL - 12

SP - 1369

EP - 1377

JO - Semiconductor science and technology

JF - Semiconductor science and technology

IS - 11

ER -

Electrical and thermal simulation of local effects for electromigration

Abstract

Keywords

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