Electrical characterisation and properties of LPCVD WSi-N barrier layers for Cu-metallization

Svetlana Nikolajevna van Nieuwkasteele-Bystrova, J. Holleman, P.H. Woerlee, Robertus A.M. Wolters

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Proceedings of SAFE conference 2000
Place of Publication	Veldhoven, The Netherlands
Pages	-
Number of pages	3
Publication status	Published - 29 Nov 2000

Keywords

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title = "Electrical characterisation and properties of LPCVD WSi-N barrier layers for Cu-metallization",

keywords = "METIS-113895",

author = "{van Nieuwkasteele-Bystrova}, {Svetlana Nikolajevna} and J. Holleman and P.H. Woerlee and Wolters, {Robertus A.M.}",

year = "2000",

month = nov,

day = "29",

language = "Undefined",

pages = "--",

booktitle = "Proceedings of SAFE conference 2000",

}

Electrical characterisation and properties of LPCVD WSi-N barrier layers for Cu-metallization. / van Nieuwkasteele-Bystrova, Svetlana Nikolajevna; Holleman, J.; Woerlee, P.H. et al.
Proceedings of SAFE conference 2000. Veldhoven, The Netherlands, 2000. p. -.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Electrical characterisation and properties of LPCVD WSi-N barrier layers for Cu-metallization

AU - van Nieuwkasteele-Bystrova, Svetlana Nikolajevna

AU - Holleman, J.

AU - Woerlee, P.H.

AU - Wolters, Robertus A.M.

PY - 2000/11/29

Y1 - 2000/11/29

KW - METIS-113895

M3 - Conference contribution

SP - -

BT - Proceedings of SAFE conference 2000

CY - Veldhoven, The Netherlands

ER -