Electrical characterization of advanced gate dielectrics

Robin Degraeve, Jurriaan Schmitz, Luigi Pantisano, Eddy Simoen, Michel Houssa, Ben Kaczer, Guido Groeseneken

    Research output: Chapter in Book/Report/Conference proceedingChapterAcademicpeer-review

    1 Citation (Scopus)


    The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments made by the scientific leaders in the area of modern dielectric films for advanced microelectronic applications. It contains clear, concise explanations of material science of dielectric films and their problem for device operation, including high-k, low-k, medium-k dielectric films and also specific features and requirements for dielectric films used in the packaging technology. A broad range of related topics are covered, from physical principles to design, fabrication, characterization, and applications of novel dielectric films.
    Original languageEnglish
    Title of host publicationDielectric Films for Advanced Microelectronics
    EditorsMikhail R. Baklanov, Martin L. Green, Karen Maex
    Place of PublicationChichester
    Number of pages65
    ISBN (Print)978-0-470-01360-1
    Publication statusPublished - 1 Feb 2007

    Publication series

    NameWiley series in materials for electronic & optoelectronic applications
    PublisherJohn Wiley & Sons Ltd.


    • SC-CICC: Characterization of IC Components
    • IR-62754
    • METIS-256459
    • EWI-15139


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