Electrical characterization of Thin-Film structures with redeposited sidewall

Deepu Roy, Micha A.A. in 't Zandt, Robertus A.M. Wolters

    Research output: Contribution to journalArticleAcademicpeer-review

    Abstract

    Accurate electrical characterization of test structures and devices requires identification and correction for parasitic current paths in the measurement network. The sidewalls formed during reactive ion etching of thin-film phase-change material layers in argon plasma can result in parasitic current paths in the structures. In this paper, thin-film structures with redeposited sidewalls are realized, and they are experimentally characterized by electrical resistance measurements on van der Pauw test structures. The impact of conducting sidewalls on contact resistance measurements and data extraction from cross-bridge Kelvin resistor structures is discussed. The error introduced in the electrical resistance measurements from these test structures is analytically modeled. The impact on the electrical performance of devices due to the formation of sidewalls is also discussed.
    Original languageUndefined
    Pages (from-to)924-930
    Number of pages7
    JournalIEEE transactions on electron devices
    Volume58
    Issue number4
    DOIs
    Publication statusPublished - 1 Apr 2011

    Keywords

    • EWI-19704
    • IR-76679
    • METIS-277567

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