Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD

I.G. Isai, J. Holleman, P.H. Woerlee, Hans Wallinga

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of the SAFE Conference
    Place of PublicationVeldhoven, the Netherlands
    Pages76-81
    Number of pages6
    Publication statusPublished - 28 Nov 2001
    Event4th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2001 - Veldhoven, Netherlands
    Duration: 28 Nov 200130 Nov 2001

    Workshop

    Workshop4th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2001
    CountryNetherlands
    CityVeldhoven
    Period28/11/0130/11/01

    Keywords

    • METIS-200746

    Cite this

    Isai, I. G., Holleman, J., Woerlee, P. H., & Wallinga, H. (2001). Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD. In Proceedings of the SAFE Conference (pp. 76-81). Veldhoven, the Netherlands.
    Isai, I.G. ; Holleman, J. ; Woerlee, P.H. ; Wallinga, Hans. / Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD. Proceedings of the SAFE Conference. Veldhoven, the Netherlands, 2001. pp. 76-81
    @inproceedings{b0c4452134844383bad6bd92f481694e,
    title = "Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD",
    keywords = "METIS-200746",
    author = "I.G. Isai and J. Holleman and P.H. Woerlee and Hans Wallinga",
    year = "2001",
    month = "11",
    day = "28",
    language = "Undefined",
    isbn = "90-73461294",
    pages = "76--81",
    booktitle = "Proceedings of the SAFE Conference",

    }

    Isai, IG, Holleman, J, Woerlee, PH & Wallinga, H 2001, Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD. in Proceedings of the SAFE Conference. Veldhoven, the Netherlands, pp. 76-81, 4th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2001, Veldhoven, Netherlands, 28/11/01.

    Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD. / Isai, I.G.; Holleman, J.; Woerlee, P.H.; Wallinga, Hans.

    Proceedings of the SAFE Conference. Veldhoven, the Netherlands, 2001. p. 76-81.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    TY - GEN

    T1 - Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD

    AU - Isai, I.G.

    AU - Holleman, J.

    AU - Woerlee, P.H.

    AU - Wallinga, Hans

    PY - 2001/11/28

    Y1 - 2001/11/28

    KW - METIS-200746

    M3 - Conference contribution

    SN - 90-73461294

    SP - 76

    EP - 81

    BT - Proceedings of the SAFE Conference

    CY - Veldhoven, the Netherlands

    ER -

    Isai IG, Holleman J, Woerlee PH, Wallinga H. Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD. In Proceedings of the SAFE Conference. Veldhoven, the Netherlands. 2001. p. 76-81