Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD

I.G. Isai, J. Holleman, P.H. Woerlee, Hans Wallinga

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of the SAFE Conference
    Place of PublicationVeldhoven, the Netherlands
    Pages76-81
    Number of pages6
    Publication statusPublished - 28 Nov 2001
    Event4th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2001 - Veldhoven, Netherlands
    Duration: 28 Nov 200130 Nov 2001

    Workshop

    Workshop4th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2001
    CountryNetherlands
    CityVeldhoven
    Period28/11/0130/11/01

    Keywords

    • METIS-200746

    Cite this

    Isai, I. G., Holleman, J., Woerlee, P. H., & Wallinga, H. (2001). Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD. In Proceedings of the SAFE Conference (pp. 76-81). Veldhoven, the Netherlands.