Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD

I.G. Isai; J. Holleman; P.H. Woerlee; Hans Wallinga

Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD

I.G. Isai
, J. Holleman
, P.H. Woerlee
, Hans Wallinga

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Proceedings of the SAFE Conference
Place of Publication	Veldhoven, the Netherlands
Pages	76-81
Number of pages	6
Publication status	Published - 28 Nov 2001
Event	4th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2001 - Veldhoven, Netherlands Duration: 28 Nov 2001 → 30 Nov 2001

Workshop

Workshop	4th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2001
Country/Territory	Netherlands
City	Veldhoven
Period	28/11/01 → 30/11/01

Keywords

METIS-200746

Cite this

@inproceedings{b0c4452134844383bad6bd92f481694e,

title = "Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD",

keywords = "METIS-200746",

author = "I.G. Isai and J. Holleman and P.H. Woerlee and Hans Wallinga",

year = "2001",

month = nov,

day = "28",

language = "Undefined",

isbn = "90-73461294",

pages = "76--81",

booktitle = "Proceedings of the SAFE Conference",

note = "4th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2001 ; Conference date: 28-11-2001 Through 30-11-2001",

}

TY - GEN

T1 - Electrical Conduction Processes in Silicon Oxide Films Obtained by ECR PECVD

AU - Isai, I.G.

AU - Holleman, J.

AU - Woerlee, P.H.

AU - Wallinga, Hans

PY - 2001/11/28

Y1 - 2001/11/28

KW - METIS-200746

M3 - Conference contribution

SN - 90-73461294

SP - 76

EP - 81

BT - Proceedings of the SAFE Conference

CY - Veldhoven, the Netherlands

T2 - 4th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2001

Y2 - 28 November 2001 through 30 November 2001

ER -