Electrochemical metallization ReRAMs (ECM) - Experiments and modelling: General discussion

Elia Ambrosi; Philip Bartlett; Alexandra I. Berg; Stefano Brivio; Geoffrey Burr; Sweety Deswal; Jonas Deuermeier; Masa Aki Haga; Asal Kiazadeh; Gabriela Kissling; Michael Kozicki; Cina Foroutan-Nejad; Ella Gale; Yago Gonzalez-Velo; Anouk Goossens; Ludovic Goux; Tsuyoshi Hasegawa; Hans Hilgenkamp; Ruomeng Huang; Sherif Ibrahim; Daniele Ielmini; Anthony J. Kenyon; Vladimir Kolosov; Yang Li; Sayani Majumdar; Gianluca Milano; Themis Prodromakis; Niloufar Raeishosseini; Vikas Rana; Carlo Ricciardi; Monica Santamaria; Alexander Shluger; Ilia Valov; Rainer Waser; R. Stanley Williams; Dirk Wouters; Yuchao Yang; Andrea Zaffora

doi:10.1039/c8fd90059k

Electrochemical metallization ReRAMs (ECM) - Experiments and modelling: General discussion

Elia Ambrosi^*, Philip Bartlett, Alexandra I. Berg, Stefano Brivio, Geoffrey Burr, Sweety Deswal, Jonas Deuermeier, Masa Aki Haga, Asal Kiazadeh, Gabriela Kissling, Michael Kozicki, Cina Foroutan-Nejad, Ella Gale, Yago Gonzalez-Velo, Anouk Goossens, Ludovic Goux, Tsuyoshi Hasegawa, Hans Hilgenkamp, Ruomeng Huang, Sherif IbrahimDaniele Ielmini, Anthony J. Kenyon, Vladimir Kolosov, Yang Li, Sayani Majumdar, Gianluca Milano, Themis Prodromakis, Niloufar Raeishosseini, Vikas Rana, Carlo Ricciardi, Monica Santamaria, Alexander Shluger, Ilia Valov, Rainer Waser, R. Stanley Williams, Dirk Wouters, Yuchao Yang, Andrea Zaffora

^*Corresponding author for this work

Interfaces and Correlated Electron Systems

Research output: Contribution to journal › Comment/Letter to the editor › Academic › peer-review

6 Citations (Scopus)

17 Downloads (Pure)

Original language	English
Pages (from-to)	115-150
Number of pages	6
Journal	Faraday discussions
Volume	213
DOIs	https://doi.org/10.1039/c8fd90059k
Publication status	Published - 21 Jan 2019

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22/4 OA procedure

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ElectrochemicalmetallizationReRAMsFinal published version, 975 KBLicence: Taverne

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Ambrosi, E., Bartlett, P., Berg, A. I., Brivio, S., Burr, G., Deswal, S., Deuermeier, J., Haga, M. A., Kiazadeh, A., Kissling, G., Kozicki, M., Foroutan-Nejad, C., Gale, E., Gonzalez-Velo, Y., Goossens, A., Goux, L., Hasegawa, T., Hilgenkamp, H., Huang, R., ... Zaffora, A. (2019). Electrochemical metallization ReRAMs (ECM) - Experiments and modelling: General discussion. Faraday discussions, 213, 115-150. https://doi.org/10.1039/c8fd90059k

@article{ec70f7d209c34dccb258a89754ba7e72,

title = "Electrochemical metallization ReRAMs (ECM) - Experiments and modelling: General discussion",

keywords = "22/4 OA procedure",

author = "Elia Ambrosi and Philip Bartlett and Berg, {Alexandra I.} and Stefano Brivio and Geoffrey Burr and Sweety Deswal and Jonas Deuermeier and Haga, {Masa Aki} and Asal Kiazadeh and Gabriela Kissling and Michael Kozicki and Cina Foroutan-Nejad and Ella Gale and Yago Gonzalez-Velo and Anouk Goossens and Ludovic Goux and Tsuyoshi Hasegawa and Hans Hilgenkamp and Ruomeng Huang and Sherif Ibrahim and Daniele Ielmini and Kenyon, {Anthony J.} and Vladimir Kolosov and Yang Li and Sayani Majumdar and Gianluca Milano and Themis Prodromakis and Niloufar Raeishosseini and Vikas Rana and Carlo Ricciardi and Monica Santamaria and Alexander Shluger and Ilia Valov and Rainer Waser and {Stanley Williams}, R. and Dirk Wouters and Yuchao Yang and Andrea Zaffora",

year = "2019",

month = jan,

day = "21",

doi = "10.1039/c8fd90059k",

language = "English",

volume = "213",

pages = "115--150",

journal = "Faraday discussions",

issn = "1359-6640",

publisher = "Royal Society of Chemistry",

}

Ambrosi, E, Bartlett, P, Berg, AI, Brivio, S, Burr, G, Deswal, S, Deuermeier, J, Haga, MA, Kiazadeh, A, Kissling, G, Kozicki, M, Foroutan-Nejad, C, Gale, E, Gonzalez-Velo, Y, Goossens, A, Goux, L, Hasegawa, T, Hilgenkamp, H, Huang, R, Ibrahim, S, Ielmini, D, Kenyon, AJ, Kolosov, V, Li, Y, Majumdar, S, Milano, G, Prodromakis, T, Raeishosseini, N, Rana, V, Ricciardi, C, Santamaria, M, Shluger, A, Valov, I, Waser, R, Stanley Williams, R, Wouters, D, Yang, Y & Zaffora, A 2019, 'Electrochemical metallization ReRAMs (ECM) - Experiments and modelling: General discussion', Faraday discussions, vol. 213, pp. 115-150. https://doi.org/10.1039/c8fd90059k

TY - JOUR

T1 - Electrochemical metallization ReRAMs (ECM) - Experiments and modelling

T2 - General discussion

AU - Ambrosi, Elia

AU - Bartlett, Philip

AU - Berg, Alexandra I.

AU - Brivio, Stefano

AU - Burr, Geoffrey

AU - Deswal, Sweety

AU - Deuermeier, Jonas

AU - Haga, Masa Aki

AU - Kiazadeh, Asal

AU - Kissling, Gabriela

AU - Kozicki, Michael

AU - Foroutan-Nejad, Cina

AU - Gale, Ella

AU - Gonzalez-Velo, Yago

AU - Goossens, Anouk

AU - Goux, Ludovic

AU - Hasegawa, Tsuyoshi

AU - Hilgenkamp, Hans

AU - Huang, Ruomeng

AU - Ibrahim, Sherif

AU - Ielmini, Daniele

AU - Kenyon, Anthony J.

AU - Kolosov, Vladimir

AU - Li, Yang

AU - Majumdar, Sayani

AU - Milano, Gianluca

AU - Prodromakis, Themis

AU - Raeishosseini, Niloufar

AU - Rana, Vikas

AU - Ricciardi, Carlo

AU - Santamaria, Monica

AU - Shluger, Alexander

AU - Valov, Ilia

AU - Waser, Rainer

AU - Stanley Williams, R.

AU - Wouters, Dirk

AU - Yang, Yuchao

AU - Zaffora, Andrea

PY - 2019/1/21

Y1 - 2019/1/21

KW - 22/4 OA procedure

UR - http://www.scopus.com/inward/record.url?scp=85061771186&partnerID=8YFLogxK

U2 - 10.1039/c8fd90059k

DO - 10.1039/c8fd90059k

M3 - Comment/Letter to the editor

AN - SCOPUS:85061771186

SN - 1359-6640

VL - 213

SP - 115

EP - 150

JO - Faraday discussions

JF - Faraday discussions

ER -

Electrochemical metallization ReRAMs (ECM) - Experiments and modelling: General discussion

Keywords

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