Electromigration Induces Stress: A study into current induced resistance changes in VLSI interconnects

V. Petrescu

    Research output: ThesisPhD Thesis - Research UT, graduation UT

    Original languageEnglish
    Awarding Institution
    • University of Twente
    Supervisors/Advisors
    • Kuper, F.G., Supervisor
    Award date7 Jan 2000
    Place of PublicationEnschede
    Publisher
    Print ISBNs90-36513979
    Publication statusPublished - 7 Jan 2000

    Keywords

    • METIS-111450

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