Electron Beam Lithography of HSQ and PMMA Resists and Importance of their Properties to Link the Nano World to the Micro World

B. Kaleli, Antonius A.I. Aarnink, Sander M. Smits, Raymond Josephus Engelbart Hueting, Robertus A.M. Wolters, Jurriaan Schmitz

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

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