Electronegativity-dependent cleaning of tin and tin hydride containing contamination of EUV optics

Research output: Contribution to conferencePosterOther research output

Abstract

Extreme ultraviolet lithography (EUVL) uses emission from a tin plasma as a light source. The mirrors that collect the light are subject to a hostile environment, consisting of hydrogen, background gases, as well as tin in gas, liquid, and ionized states. Understanding how this environment interacts with the mirror surface is critical to designing plasma-facing surfaces that are cleanable and have a sufficiently long lifetime. We hypothesize that the lifetime and clean-ability of a facing surface depends on the relative electronegativities of the metal, tin, and the cleaning agent. In this study, metal surfaces, which model the plasma-facing surface, were deposited onto a silicon wafer. The deposition of tin and subsequent cleaning via hydrogen radicals was studied using in situ ellipsometry, atomic force microscopy, and X-Ray photoelectron spectroscopy. Early results on Si, and Ru show different cleaning rates and different deposition morphologies, in agreement with published results.
Original languageEnglish
Pages-
Publication statusPublished - 21 Jan 2014
EventPhysics@FOM Veldhoven 2014 - Veldhoven, Netherlands
Duration: 21 Jan 201422 Jan 2014

Conference

ConferencePhysics@FOM Veldhoven 2014
CountryNetherlands
CityVeldhoven
Period21/01/1422/01/14

Fingerprint

cleaning
hydrides
tin
contamination
optics
mirrors
life (durability)
hydrogen
gases
ellipsometry
metal surfaces
light sources
lithography
photoelectron spectroscopy
atomic force microscopy
wafers
silicon
liquids
metals
x rays

Keywords

  • METIS-303794

Cite this

Pachecka, M., Lee, C. J., Sturm, J. M., & Bijkerk, F. (2014). Electronegativity-dependent cleaning of tin and tin hydride containing contamination of EUV optics. -. Poster session presented at Physics@FOM Veldhoven 2014, Veldhoven, Netherlands.
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title = "Electronegativity-dependent cleaning of tin and tin hydride containing contamination of EUV optics",
abstract = "Extreme ultraviolet lithography (EUVL) uses emission from a tin plasma as a light source. The mirrors that collect the light are subject to a hostile environment, consisting of hydrogen, background gases, as well as tin in gas, liquid, and ionized states. Understanding how this environment interacts with the mirror surface is critical to designing plasma-facing surfaces that are cleanable and have a sufficiently long lifetime. We hypothesize that the lifetime and clean-ability of a facing surface depends on the relative electronegativities of the metal, tin, and the cleaning agent. In this study, metal surfaces, which model the plasma-facing surface, were deposited onto a silicon wafer. The deposition of tin and subsequent cleaning via hydrogen radicals was studied using in situ ellipsometry, atomic force microscopy, and X-Ray photoelectron spectroscopy. Early results on Si, and Ru show different cleaning rates and different deposition morphologies, in agreement with published results.",
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author = "Malgorzata Pachecka and Lee, {Christopher James} and Sturm, {Jacobus Marinus} and Frederik Bijkerk",
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note = "Physics@FOM Veldhoven 2014 ; Conference date: 21-01-2014 Through 22-01-2014",

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Pachecka, M, Lee, CJ, Sturm, JM & Bijkerk, F 2014, 'Electronegativity-dependent cleaning of tin and tin hydride containing contamination of EUV optics' Physics@FOM Veldhoven 2014, Veldhoven, Netherlands, 21/01/14 - 22/01/14, pp. -.

Electronegativity-dependent cleaning of tin and tin hydride containing contamination of EUV optics. / Pachecka, Malgorzata; Lee, Christopher James; Sturm, Jacobus Marinus; Bijkerk, Frederik.

2014. - Poster session presented at Physics@FOM Veldhoven 2014, Veldhoven, Netherlands.

Research output: Contribution to conferencePosterOther research output

TY - CONF

T1 - Electronegativity-dependent cleaning of tin and tin hydride containing contamination of EUV optics

AU - Pachecka, Malgorzata

AU - Lee, Christopher James

AU - Sturm, Jacobus Marinus

AU - Bijkerk, Frederik

PY - 2014/1/21

Y1 - 2014/1/21

N2 - Extreme ultraviolet lithography (EUVL) uses emission from a tin plasma as a light source. The mirrors that collect the light are subject to a hostile environment, consisting of hydrogen, background gases, as well as tin in gas, liquid, and ionized states. Understanding how this environment interacts with the mirror surface is critical to designing plasma-facing surfaces that are cleanable and have a sufficiently long lifetime. We hypothesize that the lifetime and clean-ability of a facing surface depends on the relative electronegativities of the metal, tin, and the cleaning agent. In this study, metal surfaces, which model the plasma-facing surface, were deposited onto a silicon wafer. The deposition of tin and subsequent cleaning via hydrogen radicals was studied using in situ ellipsometry, atomic force microscopy, and X-Ray photoelectron spectroscopy. Early results on Si, and Ru show different cleaning rates and different deposition morphologies, in agreement with published results.

AB - Extreme ultraviolet lithography (EUVL) uses emission from a tin plasma as a light source. The mirrors that collect the light are subject to a hostile environment, consisting of hydrogen, background gases, as well as tin in gas, liquid, and ionized states. Understanding how this environment interacts with the mirror surface is critical to designing plasma-facing surfaces that are cleanable and have a sufficiently long lifetime. We hypothesize that the lifetime and clean-ability of a facing surface depends on the relative electronegativities of the metal, tin, and the cleaning agent. In this study, metal surfaces, which model the plasma-facing surface, were deposited onto a silicon wafer. The deposition of tin and subsequent cleaning via hydrogen radicals was studied using in situ ellipsometry, atomic force microscopy, and X-Ray photoelectron spectroscopy. Early results on Si, and Ru show different cleaning rates and different deposition morphologies, in agreement with published results.

KW - METIS-303794

M3 - Poster

SP - -

ER -

Pachecka M, Lee CJ, Sturm JM, Bijkerk F. Electronegativity-dependent cleaning of tin and tin hydride containing contamination of EUV optics. 2014. Poster session presented at Physics@FOM Veldhoven 2014, Veldhoven, Netherlands.