Electrostatically driven vacuum-encapsulated polysilicon resonators: Part I. design and fabrication

Rob Legtenberg; Harrie A.C. Tilmans

doi:10.1016/0924-4247(94)00812-4

Electrostatically driven vacuum-encapsulated polysilicon resonators: Part I. design and fabrication

Rob Legtenberg, Harrie A.C. Tilmans

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Abstract

Basic design issues and a fabrication process based on surface-micromachining techniques for electrostatically driven vacuum-encapsulated polysilicon resonators are presented. A novel freeze-drying method that does not require vacuum equipment is presented. Reactive sealing with LPCVD silicon nitride is used to create the evacuated cavity, resulting in cavity pressures close to the deposition pressure. Design issues regarding choice of materials, technology and layout are discussed. First experimental results, including an admittance plot of the one-port resonator and a plot indicating the dependence of the Q-factor on the resonator geometry and ambient pressure, are presented.

Original language	English
Pages (from-to)	57-66
Number of pages	10
Journal	Sensors and Actuators A: Physical
Volume	1994
Issue number	45
DOIs	https://doi.org/10.1016/0924-4247(94)00812-4
Publication status	Published - 1994

Keywords

Electrostatic excitation and detection
Surface-micromachining techniques
Polysilicon resonators
Vacuum encapsulation

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This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1016/0924-4247(94)00812-4

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title = "Electrostatically driven vacuum-encapsulated polysilicon resonators: Part I. design and fabrication",

abstract = "Basic design issues and a fabrication process based on surface-micromachining techniques for electrostatically driven vacuum-encapsulated polysilicon resonators are presented. A novel freeze-drying method that does not require vacuum equipment is presented. Reactive sealing with LPCVD silicon nitride is used to create the evacuated cavity, resulting in cavity pressures close to the deposition pressure. Design issues regarding choice of materials, technology and layout are discussed. First experimental results, including an admittance plot of the one-port resonator and a plot indicating the dependence of the Q-factor on the resonator geometry and ambient pressure, are presented.",

keywords = "Electrostatic excitation and detection, Surface-micromachining techniques, Polysilicon resonators, Vacuum encapsulation",

author = "Rob Legtenberg and Tilmans, {Harrie A.C.}",

year = "1994",

doi = "10.1016/0924-4247(94)00812-4",

language = "English",

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T1 - Electrostatically driven vacuum-encapsulated polysilicon resonators

T2 - Part I. design and fabrication

AU - Legtenberg, Rob

AU - Tilmans, Harrie A.C.

PY - 1994

Y1 - 1994

N2 - Basic design issues and a fabrication process based on surface-micromachining techniques for electrostatically driven vacuum-encapsulated polysilicon resonators are presented. A novel freeze-drying method that does not require vacuum equipment is presented. Reactive sealing with LPCVD silicon nitride is used to create the evacuated cavity, resulting in cavity pressures close to the deposition pressure. Design issues regarding choice of materials, technology and layout are discussed. First experimental results, including an admittance plot of the one-port resonator and a plot indicating the dependence of the Q-factor on the resonator geometry and ambient pressure, are presented.

AB - Basic design issues and a fabrication process based on surface-micromachining techniques for electrostatically driven vacuum-encapsulated polysilicon resonators are presented. A novel freeze-drying method that does not require vacuum equipment is presented. Reactive sealing with LPCVD silicon nitride is used to create the evacuated cavity, resulting in cavity pressures close to the deposition pressure. Design issues regarding choice of materials, technology and layout are discussed. First experimental results, including an admittance plot of the one-port resonator and a plot indicating the dependence of the Q-factor on the resonator geometry and ambient pressure, are presented.

KW - Electrostatic excitation and detection

KW - Surface-micromachining techniques

KW - Polysilicon resonators

KW - Vacuum encapsulation

U2 - 10.1016/0924-4247(94)00812-4

DO - 10.1016/0924-4247(94)00812-4

M3 - Article

SN - 0924-4247

VL - 1994

SP - 57

EP - 66

JO - Sensors and Actuators A: Physical

JF - Sensors and Actuators A: Physical

IS - 45

ER -

Electrostatically driven vacuum-encapsulated polysilicon resonators: Part I. design and fabrication

Abstract

Keywords

UN SDGs

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