Electrostatically driven vacuum-encapsulated polysilicon resonators: Part I. design and fabrication

Rob Legtenberg, Harrie A.C. Tilmans

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    Abstract

    Basic design issues and a fabrication process based on surface-micromachining techniques for electrostatically driven vacuum-encapsulated polysilicon resonators are presented. A novel freeze-drying method that does not require vacuum equipment is presented. Reactive sealing with LPCVD silicon nitride is used to create the evacuated cavity, resulting in cavity pressures close to the deposition pressure. Design issues regarding choice of materials, technology and layout are discussed. First experimental results, including an admittance plot of the one-port resonator and a plot indicating the dependence of the Q-factor on the resonator geometry and ambient pressure, are presented.
    Original languageEnglish
    Pages (from-to)57-66
    Number of pages10
    JournalSensors and actuators. A: Physical
    Volume1994
    Issue number45
    DOIs
    Publication statusPublished - 1994

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    Keywords

    • METIS-111572
    • IR-14372
    • Electrostatic excitation and detection
    • Surface-micromachining techniques
    • Polysilicon resonators
    • Vacuum encapsulation

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