Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics

Juequan Chen; Eric Louis; Frederik Bijkerk; Christopher James Lee; Herbert Wormeester; Reinhard Kunze; Hagen Schmidt; Dieter Schneider; Roel Moors; Willem van Schaik; Monika Lubomska

doi:10.1117/12.824435

Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics

Juequan Chen, Eric Louis, Frederik Bijkerk, Christopher James Lee, Herbert Wormeester, Reinhard Kunze, Hagen Schmidt, Dieter Schneider, Roel Moors, Willem van Schaik, Monika Lubomska

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

1 Downloads (Pure)

Abstract

Carbon contamination layers, deposited on extreme ultraviolet (EUV) multilayer mirrors during illumination were characterized ex situ using spectroscopic ellipsometry (SE), laser generated surface acoustic waves (LG-SAW), and by their EUV reflectance loss. We show SE is more sensitive to the deposition of carbon layers than the EUV reflectance loss, even in the presence of the highly heterogeneous structure of the multilayer. SE has better overall sensitivity, with a detection limit of 0.2 nm, while LG-SAW has an approximate detection limit < 5 nm

Original language	Undefined
Title of host publication	Proceedings of SPIE, The International Society for Optical Engineering
Editors	Frank M. Schellenberg, Bruno M. La Fontaine
Publisher	SPIE
Pages	727140-
ISBN (Print)	9780819475244
DOIs	https://doi.org/10.1117/12.824435
Publication status	Published - 22 Feb 2009
Event	Alternative Lithographic Technologies: Proceedings of SPIE, The International Society for Optical Engineering - San Jose, CA Duration: 22 Feb 2009 → 27 Feb 2009

Publication series

Name	Proceedings of SPIE
Publisher	SPIE
Volume	7271
ISSN (Print)	0277-786X

Conference

Conference	Alternative Lithographic Technologies
Period	22/02/09 → 27/02/09
Other	24-26 February 2009

Keywords

Spectroscopic ellipsometry
METIS-260100
Extreme ultraviolet lithography
EUV optics
multilayer mirrors
surface acoustic wave
carbon contamination
IR-77749

Access to Document

10.1117/12.824435

Cite this

Chen, J., Louis, E., Bijkerk, F., Lee, C. J., Wormeester, H., Kunze, R., Schmidt, H., Schneider, D., Moors, R., van Schaik, W., & Lubomska, M. (2009). Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics. In F. M. Schellenberg, & B. M. La Fontaine (Eds.), Proceedings of SPIE, The International Society for Optical Engineering (pp. 727140-). (Proceedings of SPIE; Vol. 7271). SPIE. https://doi.org/10.1117/12.824435

Chen, Juequan ; Louis, Eric ; Bijkerk, Frederik ; Lee, Christopher James ; Wormeester, Herbert ; Kunze, Reinhard ; Schmidt, Hagen ; Schneider, Dieter ; Moors, Roel ; van Schaik, Willem ; Lubomska, Monika. / Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics. Proceedings of SPIE, The International Society for Optical Engineering. editor / Frank M. Schellenberg ; Bruno M. La Fontaine. SPIE, 2009. pp. 727140- (Proceedings of SPIE).

@inproceedings{a341aeed5dd14b3a915d2cd3f69572e2,

title = "Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics",

abstract = "Carbon contamination layers, deposited on extreme ultraviolet (EUV) multilayer mirrors during illumination were characterized ex situ using spectroscopic ellipsometry (SE), laser generated surface acoustic waves (LG-SAW), and by their EUV reflectance loss. We show SE is more sensitive to the deposition of carbon layers than the EUV reflectance loss, even in the presence of the highly heterogeneous structure of the multilayer. SE has better overall sensitivity, with a detection limit of 0.2 nm, while LG-SAW has an approximate detection limit < 5 nm",

keywords = "Spectroscopic ellipsometry, METIS-260100, Extreme ultraviolet lithography, EUV optics, multilayer mirrors, surface acoustic wave, carbon contamination, IR-77749",

author = "Juequan Chen and Eric Louis and Frederik Bijkerk and Lee, {Christopher James} and Herbert Wormeester and Reinhard Kunze and Hagen Schmidt and Dieter Schneider and Roel Moors and {van Schaik}, Willem and Monika Lubomska",

year = "2009",

month = feb,

day = "22",

doi = "10.1117/12.824435",

language = "Undefined",

isbn = "9780819475244",

series = "Proceedings of SPIE",

publisher = "SPIE",

pages = "727140--",

editor = "Schellenberg, {Frank M.} and {La Fontaine}, {Bruno M.}",

booktitle = "Proceedings of SPIE, The International Society for Optical Engineering",

address = "United States",

note = "null ; Conference date: 22-02-2009 Through 27-02-2009",

}

Chen, J, Louis, E , Bijkerk, F, Lee, CJ, Wormeester, H, Kunze, R, Schmidt, H, Schneider, D, Moors, R, van Schaik, W & Lubomska, M 2009, Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics. in FM Schellenberg & BM La Fontaine (eds), Proceedings of SPIE, The International Society for Optical Engineering. Proceedings of SPIE, vol. 7271, SPIE, pp. 727140-, Alternative Lithographic Technologies, 22/02/09. https://doi.org/10.1117/12.824435

Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics. / Chen, Juequan; Louis, Eric ; Bijkerk, Frederik; Lee, Christopher James; Wormeester, Herbert; Kunze, Reinhard; Schmidt, Hagen; Schneider, Dieter; Moors, Roel; van Schaik, Willem; Lubomska, Monika.

Proceedings of SPIE, The International Society for Optical Engineering. ed. / Frank M. Schellenberg; Bruno M. La Fontaine. SPIE, 2009. p. 727140- (Proceedings of SPIE; Vol. 7271).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics

AU - Chen, Juequan

AU - Louis, Eric

AU - Bijkerk, Frederik

AU - Lee, Christopher James

AU - Wormeester, Herbert

AU - Kunze, Reinhard

AU - Schmidt, Hagen

AU - Schneider, Dieter

AU - Moors, Roel

AU - van Schaik, Willem

AU - Lubomska, Monika

PY - 2009/2/22

Y1 - 2009/2/22

N2 - Carbon contamination layers, deposited on extreme ultraviolet (EUV) multilayer mirrors during illumination were characterized ex situ using spectroscopic ellipsometry (SE), laser generated surface acoustic waves (LG-SAW), and by their EUV reflectance loss. We show SE is more sensitive to the deposition of carbon layers than the EUV reflectance loss, even in the presence of the highly heterogeneous structure of the multilayer. SE has better overall sensitivity, with a detection limit of 0.2 nm, while LG-SAW has an approximate detection limit < 5 nm

AB - Carbon contamination layers, deposited on extreme ultraviolet (EUV) multilayer mirrors during illumination were characterized ex situ using spectroscopic ellipsometry (SE), laser generated surface acoustic waves (LG-SAW), and by their EUV reflectance loss. We show SE is more sensitive to the deposition of carbon layers than the EUV reflectance loss, even in the presence of the highly heterogeneous structure of the multilayer. SE has better overall sensitivity, with a detection limit of 0.2 nm, while LG-SAW has an approximate detection limit < 5 nm

KW - Spectroscopic ellipsometry

KW - METIS-260100

KW - Extreme ultraviolet lithography

KW - EUV optics

KW - multilayer mirrors

KW - surface acoustic wave

KW - carbon contamination

KW - IR-77749

U2 - 10.1117/12.824435

DO - 10.1117/12.824435

M3 - Conference contribution

SN - 9780819475244

T3 - Proceedings of SPIE

SP - 727140-

BT - Proceedings of SPIE, The International Society for Optical Engineering

A2 - Schellenberg, Frank M.

A2 - La Fontaine, Bruno M.

PB - SPIE

Y2 - 22 February 2009 through 27 February 2009

ER -