Emperical Modeling of Electromigration Early Resistance Changes

J. Niehof, H.C. de Graaff, J.F. Verweij

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings Materials Research Society, Materials Reliability in Microelectronics III
    Place of PublicationSan Fransisco, U.S.A.
    Publication statusPublished - 14 Dec 1993


    • METIS-113997

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