Encapsulation of epitaxial silicene on ZrB2 with NaCl

Frank Bert Wiggers, Y. Yamada-Takamura, Alexey Y. Kovalgin, Machiel Pieter de Jong

Research output: Contribution to journalArticleAcademicpeer-review

2 Citations (Scopus)
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Abstract

Silicene and other two-dimensional materials, such as germanene and stanene, have chemically reactive surfaces and are prone to oxidation in air, and thus require an encapsulation layer for ex situ studies or integration in an electronic device. In this work, we investigated NaCl as an encapsulation material for silicene. NaCl was deposited on the surface of epitaxial silicene on ZrB2(0001) thin films near room temperature and studied using synchrotron-based high-resolution photoelectron spectroscopy. The deposition of NaCl resulted in dissociative chemisorption, where the majority of epitaxial silicene reacted to form Si–Clx species
Original languageEnglish
Pages (from-to)1-6
Number of pages6
JournalJournal of chemical physics
DOIs
Publication statusPublished - 8 Aug 2017

Fingerprint

Encapsulation
Photoelectron spectroscopy
Chemisorption
Synchrotrons
chemisorption
synchrotrons
photoelectron spectroscopy
Oxidation
oxidation
high resolution
air
room temperature
Air
electronics
Temperature

Keywords

  • Photoelectron Spectroscopy
  • Epitaxy
  • Chemical compounds
  • semiconductor device fabrication
  • Thin films

Cite this

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Encapsulation of epitaxial silicene on ZrB2 with NaCl. / Wiggers, Frank Bert; Yamada-Takamura, Y.; Kovalgin, Alexey Y.; de Jong, Machiel Pieter.

In: Journal of chemical physics, 08.08.2017, p. 1-6.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Encapsulation of epitaxial silicene on ZrB2 with NaCl

AU - Wiggers, Frank Bert

AU - Yamada-Takamura, Y.

AU - Kovalgin, Alexey Y.

AU - de Jong, Machiel Pieter

PY - 2017/8/8

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AB - Silicene and other two-dimensional materials, such as germanene and stanene, have chemically reactive surfaces and are prone to oxidation in air, and thus require an encapsulation layer for ex situ studies or integration in an electronic device. In this work, we investigated NaCl as an encapsulation material for silicene. NaCl was deposited on the surface of epitaxial silicene on ZrB2(0001) thin films near room temperature and studied using synchrotron-based high-resolution photoelectron spectroscopy. The deposition of NaCl resulted in dissociative chemisorption, where the majority of epitaxial silicene reacted to form Si–Clx species

KW - Photoelectron Spectroscopy

KW - Epitaxy

KW - Chemical compounds

KW - semiconductor device fabrication

KW - Thin films

U2 - 10.1063/1.4985895

DO - 10.1063/1.4985895

M3 - Article

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JO - Journal of chemical physics

JF - Journal of chemical physics

SN - 0021-9606

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