Encapsulation of epitaxial silicene on ZrB2 with NaCl

Frank Bert Wiggers, Y. Yamada-Takamura, Alexey Y. Kovalgin, Machiel Pieter de Jong

    Research output: Contribution to journalArticleAcademicpeer-review

    2 Citations (Scopus)
    2 Downloads (Pure)

    Abstract

    Silicene and other two-dimensional materials, such as germanene and stanene, have chemically reactive surfaces and are prone to oxidation in air, and thus require an encapsulation layer for ex situ studies or integration in an electronic device. In this work, we investigated NaCl as an encapsulation material for silicene. NaCl was deposited on the surface of epitaxial silicene on ZrB2(0001) thin films near room temperature and studied using synchrotron-based high-resolution photoelectron spectroscopy. The deposition of NaCl resulted in dissociative chemisorption, where the majority of epitaxial silicene reacted to form Si–Clx species
    Original languageEnglish
    Pages (from-to)1-6
    Number of pages6
    JournalJournal of chemical physics
    DOIs
    Publication statusPublished - 8 Aug 2017

    Fingerprint

    Encapsulation
    Photoelectron spectroscopy
    Chemisorption
    Synchrotrons
    chemisorption
    synchrotrons
    photoelectron spectroscopy
    Oxidation
    oxidation
    high resolution
    air
    room temperature
    Air
    electronics
    Temperature

    Keywords

    • Photoelectron Spectroscopy
    • Epitaxy
    • Chemical compounds
    • semiconductor device fabrication
    • Thin films

    Cite this

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    abstract = "Silicene and other two-dimensional materials, such as germanene and stanene, have chemically reactive surfaces and are prone to oxidation in air, and thus require an encapsulation layer for ex situ studies or integration in an electronic device. In this work, we investigated NaCl as an encapsulation material for silicene. NaCl was deposited on the surface of epitaxial silicene on ZrB2(0001) thin films near room temperature and studied using synchrotron-based high-resolution photoelectron spectroscopy. The deposition of NaCl resulted in dissociative chemisorption, where the majority of epitaxial silicene reacted to form Si–Clx species",
    keywords = "Photoelectron Spectroscopy, Epitaxy, Chemical compounds, semiconductor device fabrication, Thin films",
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    year = "2017",
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    Encapsulation of epitaxial silicene on ZrB2 with NaCl. / Wiggers, Frank Bert; Yamada-Takamura, Y.; Kovalgin, Alexey Y.; de Jong, Machiel Pieter.

    In: Journal of chemical physics, 08.08.2017, p. 1-6.

    Research output: Contribution to journalArticleAcademicpeer-review

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    T1 - Encapsulation of epitaxial silicene on ZrB2 with NaCl

    AU - Wiggers, Frank Bert

    AU - Yamada-Takamura, Y.

    AU - Kovalgin, Alexey Y.

    AU - de Jong, Machiel Pieter

    PY - 2017/8/8

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    KW - Photoelectron Spectroscopy

    KW - Epitaxy

    KW - Chemical compounds

    KW - semiconductor device fabrication

    KW - Thin films

    U2 - 10.1063/1.4985895

    DO - 10.1063/1.4985895

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