Encapsulation of epitaxial silicene on ZrB2 with NaCl

F.B. Wiggers, Y. Yamada-Takamura, A.Y. Kovalgin, M.P. de Jong

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    3 Citations (Scopus)
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    Silicene and other two-dimensional materials, such as germanene and stanene, have chemically reactive surfaces and are prone to oxidation in air, and thus require an encapsulation layer for ex situ studies or integration in an electronic device. In this work, we investigated NaCl as an encapsulation material for silicene. NaCl was deposited on the surface of epitaxial silicene on ZrB2(0001) thin films near room temperature and studied using synchrotron-based high-resolution photoelectron spectroscopy. The deposition of NaCl resulted in dissociative chemisorption, where the majority of epitaxial silicene reacted to form Si–Clx species
    Original languageEnglish
    Pages (from-to)1-6
    Number of pages6
    JournalThe Journal of chemical physics
    Issue number6
    Publication statusPublished - 8 Aug 2017


    • Photoelectron Spectroscopy
    • Epitaxy
    • Chemical compounds
    • semiconductor device fabrication
    • Thin films
    • 22/3 OA procedure


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