Encapsulation of epitaxial silicene on ZrB2 with NaCl

F.B. Wiggers; Y. Yamada-Takamura; A.Y. Kovalgin; M.P. de Jong

doi:10.1063/1.4985895

Encapsulation of epitaxial silicene on ZrB2 with NaCl

F.B. Wiggers, Y. Yamada-Takamura, A.Y. Kovalgin, M.P. de Jong

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Abstract

Silicene and other two-dimensional materials, such as germanene and stanene, have chemically reactive surfaces and are prone to oxidation in air, and thus require an encapsulation layer for ex situ studies or integration in an electronic device. In this work, we investigated NaCl as an encapsulation material for silicene. NaCl was deposited on the surface of epitaxial silicene on ZrB2(0001) thin ﬁlms near room temperature and studied using synchrotron-based high-resolution photoelectron spectroscopy. The deposition of NaCl resulted in dissociative chemisorption, where the majority of epitaxial silicene reacted to form Si–Clx species

Original language	English
Pages (from-to)	1-6
Number of pages	6
Journal	The Journal of chemical physics
Volume	147
Issue number	6
DOIs	https://doi.org/10.1063/1.4985895
Publication status	Published - 8 Aug 2017

Keywords

Photoelectron Spectroscopy
Epitaxy
Chemical compounds
semiconductor device fabrication
Thin films
22/3 OA procedure

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10.1063/1.4985895

Wiggers2017encapsulationFinal published version, 609 KBLicence: Taverne

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title = "Encapsulation of epitaxial silicene on ZrB2 with NaCl",

abstract = "Silicene and other two-dimensional materials, such as germanene and stanene, have chemically reactive surfaces and are prone to oxidation in air, and thus require an encapsulation layer for ex situ studies or integration in an electronic device. In this work, we investigated NaCl as an encapsulation material for silicene. NaCl was deposited on the surface of epitaxial silicene on ZrB2(0001) thin ﬁlms near room temperature and studied using synchrotron-based high-resolution photoelectron spectroscopy. The deposition of NaCl resulted in dissociative chemisorption, where the majority of epitaxial silicene reacted to form Si–Clx species",

keywords = "Photoelectron Spectroscopy, Epitaxy, Chemical compounds, semiconductor device fabrication, Thin films, 22/3 OA procedure",

author = "F.B. Wiggers and Y. Yamada-Takamura and A.Y. Kovalgin and {de Jong}, M.P.",

year = "2017",

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doi = "10.1063/1.4985895",

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T1 - Encapsulation of epitaxial silicene on ZrB2 with NaCl

AU - Wiggers, F.B.

AU - Yamada-Takamura, Y.

AU - Kovalgin, A.Y.

AU - de Jong, M.P.

PY - 2017/8/8

Y1 - 2017/8/8

N2 - Silicene and other two-dimensional materials, such as germanene and stanene, have chemically reactive surfaces and are prone to oxidation in air, and thus require an encapsulation layer for ex situ studies or integration in an electronic device. In this work, we investigated NaCl as an encapsulation material for silicene. NaCl was deposited on the surface of epitaxial silicene on ZrB2(0001) thin ﬁlms near room temperature and studied using synchrotron-based high-resolution photoelectron spectroscopy. The deposition of NaCl resulted in dissociative chemisorption, where the majority of epitaxial silicene reacted to form Si–Clx species

AB - Silicene and other two-dimensional materials, such as germanene and stanene, have chemically reactive surfaces and are prone to oxidation in air, and thus require an encapsulation layer for ex situ studies or integration in an electronic device. In this work, we investigated NaCl as an encapsulation material for silicene. NaCl was deposited on the surface of epitaxial silicene on ZrB2(0001) thin ﬁlms near room temperature and studied using synchrotron-based high-resolution photoelectron spectroscopy. The deposition of NaCl resulted in dissociative chemisorption, where the majority of epitaxial silicene reacted to form Si–Clx species

KW - Photoelectron Spectroscopy

KW - Epitaxy

KW - Chemical compounds

KW - semiconductor device fabrication

KW - Thin films

KW - 22/3 OA procedure

U2 - 10.1063/1.4985895

DO - 10.1063/1.4985895

M3 - Article

SN - 0021-9606

VL - 147

SP - 1

EP - 6

JO - The Journal of chemical physics

JF - The Journal of chemical physics

IS - 6

ER -

Encapsulation of epitaxial silicene on ZrB2 with NaCl

Abstract

Keywords

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