Energy Dissipation in Monolayer MoS2 Electronics

Eilam Yalon, Connor J. McClellan, Kirby K.H. Smithe, Miguel Muñoz Rojo, Runjie Lily Xu, Saurabh V. Suryavanshi, Alex J. Gabourie, Christopher M. Neumann, Feng Xiong, Amir Barati Farimani, Eric Pop* (Corresponding Author)

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

154 Citations (Scopus)


The advancement of nanoscale electronics has been limited by energy dissipation challenges for over a decade. Such limitations could be particularly severe for two-dimensional (2D) semiconductors integrated with flexible substrates or multilayered processors, both being critical thermal bottlenecks. To shed light into fundamental aspects of this problem, here we report the first direct measurement of spatially resolved temperature in functioning 2D monolayer MoS2 transistors. Using Raman thermometry, we simultaneously obtain temperature maps of the device channel and its substrate. This differential measurement reveals the thermal boundary conductance of the MoS2 interface with SiO2 (14 ± 4 MW m-2 K-1) is an order magnitude larger than previously thought, yet near the low end of known solid-solid interfaces. Our study also reveals unexpected insight into nonuniformities of the MoS2 transistors (small bilayer regions) which do not cause significant self-heating, suggesting that such semiconductors are less sensitive to inhomogeneity than expected. These results provide key insights into energy dissipation of 2D semiconductors and pave the way for the future design of energy-efficient 2D electronics.

Original languageEnglish
Pages (from-to)3429-3433
Number of pages5
JournalNano letters
Issue number6
Publication statusPublished - 14 Jun 2017
Externally publishedYes


  • 2D semiconductors
  • Energy dissipation
  • MoS
  • Raman thermometry
  • thermal boundary conductance


Dive into the research topics of 'Energy Dissipation in Monolayer MoS2 Electronics'. Together they form a unique fingerprint.

Cite this