Engineering optical constants for broadband single layer antireflection coatings

S.P. Huber, R.W.E. van de Kruijs, A.E. Yakshin, E. Zoethout, F. Bijkerk

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)

Abstract

We developed and fabricated a single layer antireflection coating for the molybdenum/silicon multilayer mirrors. The 20 nm thin film of Si0.52C0.16N0.29, deposited by simultaneous electron beam evaporation and nitrogen ion implantation, causes a broadband suppression of the DUV reflectance with a maximum suppression at = 285 nm from 58% to 0.3%, corresponding to a factor of 195.
Original languageEnglish
Title of host publicationAdvances in X-Ray/EUV Optics and Components VIII
EditorsAli Khounsary, Shunji Goto, Christian Morawe
PublisherSPIE
ISBN (Print)9780819496980
DOIs
Publication statusPublished - 27 Sep 2013
EventSPIE Optical Engineering + Applications 2013 - San Diego Convention Center, San Diego, United States
Duration: 25 Aug 201329 Aug 2013

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume8848
ISSN (Print)0277-786X

Conference

ConferenceSPIE Optical Engineering + Applications 2013
CountryUnited States
CitySan Diego
Period25/08/1329/08/13

Keywords

  • METIS-299275
  • IR-88104

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  • Cite this

    Huber, S. P., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E., & Bijkerk, F. (2013). Engineering optical constants for broadband single layer antireflection coatings. In A. Khounsary, S. Goto, & C. Morawe (Eds.), Advances in X-Ray/EUV Optics and Components VIII [884814] (Proceedings of SPIE; Vol. 8848). SPIE. https://doi.org/10.1117/12.2026546