Engineering optical constants for broadband single layer antireflection coatings

S.P. Huber; R.W.E. van de Kruijs; A.E. Yakshin; E. Zoethout; F. Bijkerk

doi:10.1117/12.2026546

Engineering optical constants for broadband single layer antireflection coatings

S.P. Huber, R.W.E. van de Kruijs, A.E. Yakshin, E. Zoethout, F. Bijkerk

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

4 Citations (Scopus)

Abstract

We developed and fabricated a single layer antireflection coating for the molybdenum/silicon multilayer mirrors. The 20 nm thin film of Si0.52C0.16N0.29, deposited by simultaneous electron beam evaporation and nitrogen ion implantation, causes a broadband suppression of the DUV reflectance with a maximum suppression at = 285 nm from 58% to 0.3%, corresponding to a factor of 195.

Original language	English
Title of host publication	Advances in X-Ray/EUV Optics and Components VIII
Editors	Ali Khounsary, Shunji Goto, Christian Morawe
Publisher	SPIE
ISBN (Print)	9780819496980
DOIs	https://doi.org/10.1117/12.2026546
Publication status	Published - 27 Sep 2013
Event	SPIE Optical Engineering + Applications 2013 - San Diego Convention Center, San Diego, United States Duration: 25 Aug 2013 → 29 Aug 2013

Publication series

Name	Proceedings of SPIE
Publisher	SPIE
Volume	8848
ISSN (Print)	0277-786X

Conference

Conference	SPIE Optical Engineering + Applications 2013
Country/Territory	United States
City	San Diego
Period	25/08/13 → 29/08/13

Keywords

METIS-299275
IR-88104

Access to Document

10.1117/12.2026546

Cite this

@inproceedings{62cb759f3ec146ab83d354e4847b5347,

title = "Engineering optical constants for broadband single layer antireflection coatings",

abstract = "We developed and fabricated a single layer antireflection coating for the molybdenum/silicon multilayer mirrors. The 20 nm thin film of Si0.52C0.16N0.29, deposited by simultaneous electron beam evaporation and nitrogen ion implantation, causes a broadband suppression of the DUV reflectance with a maximum suppression at = 285 nm from 58% to 0.3%, corresponding to a factor of 195.",

keywords = "METIS-299275, IR-88104",

author = "S.P. Huber and {van de Kruijs}, R.W.E. and A.E. Yakshin and E. Zoethout and F. Bijkerk",

year = "2013",

month = sep,

day = "27",

doi = "10.1117/12.2026546",

language = "English",

isbn = "9780819496980",

series = "Proceedings of SPIE",

publisher = "SPIE",

editor = "Ali Khounsary and Shunji Goto and Christian Morawe",

booktitle = "Advances in X-Ray/EUV Optics and Components VIII",

note = "SPIE Optical Engineering + Applications 2013 ; Conference date: 25-08-2013 Through 29-08-2013",

}

Huber, SP, van de Kruijs, RWE , Yakshin, AE, Zoethout, E & Bijkerk, F 2013, Engineering optical constants for broadband single layer antireflection coatings. in A Khounsary, S Goto & C Morawe (eds), Advances in X-Ray/EUV Optics and Components VIII., 884814, Proceedings of SPIE, vol. 8848, SPIE, SPIE Optical Engineering + Applications 2013, San Diego, California, United States, 25/08/13. https://doi.org/10.1117/12.2026546

Engineering optical constants for broadband single layer antireflection coatings. / Huber, S.P.; van de Kruijs, R.W.E.; Yakshin, A.E. et al.

Advances in X-Ray/EUV Optics and Components VIII. ed. / Ali Khounsary; Shunji Goto; Christian Morawe. SPIE, 2013. 884814 (Proceedings of SPIE; Vol. 8848).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Engineering optical constants for broadband single layer antireflection coatings

AU - Huber, S.P.

AU - van de Kruijs, R.W.E.

AU - Yakshin, A.E.

AU - Zoethout, E.

AU - Bijkerk, F.

PY - 2013/9/27

Y1 - 2013/9/27

N2 - We developed and fabricated a single layer antireflection coating for the molybdenum/silicon multilayer mirrors. The 20 nm thin film of Si0.52C0.16N0.29, deposited by simultaneous electron beam evaporation and nitrogen ion implantation, causes a broadband suppression of the DUV reflectance with a maximum suppression at = 285 nm from 58% to 0.3%, corresponding to a factor of 195.

AB - We developed and fabricated a single layer antireflection coating for the molybdenum/silicon multilayer mirrors. The 20 nm thin film of Si0.52C0.16N0.29, deposited by simultaneous electron beam evaporation and nitrogen ion implantation, causes a broadband suppression of the DUV reflectance with a maximum suppression at = 285 nm from 58% to 0.3%, corresponding to a factor of 195.

KW - METIS-299275

KW - IR-88104

U2 - 10.1117/12.2026546

DO - 10.1117/12.2026546

M3 - Conference contribution

SN - 9780819496980

T3 - Proceedings of SPIE

BT - Advances in X-Ray/EUV Optics and Components VIII

A2 - Khounsary, Ali

A2 - Goto, Shunji

A2 - Morawe, Christian

PB - SPIE

T2 - SPIE Optical Engineering + Applications 2013

Y2 - 25 August 2013 through 29 August 2013

ER -

Engineering optical constants for broadband single layer antireflection coatings

Abstract

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Keywords

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