Enhanced performance of EUV multilayer coatings

E. Louis*, A. E. Yakshin, E. Zoethout, R. W.E. Van De Kruijs, I. Nedelcu, S. Alonso Van Der Westen, T. Tsarfati, F. Bijkerk, H. Enkisch, S. Müllender, B. Wolschrijn, B. Mertens

*Corresponding author for this work

Research output: Contribution to journalConference articleAcademicpeer-review

4 Citations (Scopus)

Abstract

Reported is a summary of the development of EUV Mo/Si multilayer coating technology. Though the results are developed for application in Extreme Ultraviolet Lithography, they are of a broader relevance including optics for astronomy. The coating process used consists of electron beam evaporation in combination with low energy ion beam smoothening. The radiation hardness of these coatings is discussed and methods to reduce the multilayer induced substrate stress. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 65%, while the non correctable figure error added by the full multilayer stack is controlled to better than 15 picometer.

Original languageEnglish
Article number590002
Pages (from-to)1-4
Number of pages4
JournalProceedings of SPIE - the international society for optical engineering
Volume5900
DOIs
Publication statusPublished - 1 Dec 2005
Externally publishedYes
EventOptics for EUV, X-Ray, and Gamma-Ray Astronomy II 2005 - San Diego, United States
Duration: 3 Aug 20054 Aug 2005
Conference number: 2

Keywords

  • EUV Astronomy
  • EUV Lithography
  • Mo/Si multilayers

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