Enhanced performance of EUV multilayer coatings

E. Louis; A. E. Yakshin; E. Zoethout; R. W.E. Van De Kruijs; I. Nedelcu; S. Alonso Van Der Westen; T. Tsarfati; F. Bijkerk; H. Enkisch; S. Müllender; B. Wolschrijn; B. Mertens

doi:10.1117/12.616902

Enhanced performance of EUV multilayer coatings

E. Louis^*, A. E. Yakshin, E. Zoethout, R. W.E. Van De Kruijs, I. Nedelcu, S. Alonso Van Der Westen, T. Tsarfati, F. Bijkerk, H. Enkisch, S. Müllender, B. Wolschrijn, B. Mertens

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › Academic › peer-review

5 Citations (Scopus)

Abstract

Reported is a summary of the development of EUV Mo/Si multilayer coating technology. Though the results are developed for application in Extreme Ultraviolet Lithography, they are of a broader relevance including optics for astronomy. The coating process used consists of electron beam evaporation in combination with low energy ion beam smoothening. The radiation hardness of these coatings is discussed and methods to reduce the multilayer induced substrate stress. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 65%, while the non correctable figure error added by the full multilayer stack is controlled to better than 15 picometer.

Original language	English
Article number	590002
Pages (from-to)	1-4
Number of pages	4
Journal	Proceedings of SPIE - the international society for optical engineering
Volume	5900
DOIs	https://doi.org/10.1117/12.616902
Publication status	Published - 1 Dec 2005
Externally published	Yes
Event	Optics for EUV, X-Ray, and Gamma-Ray Astronomy II 2005 - San Diego, United States Duration: 3 Aug 2005 → 4 Aug 2005 Conference number: 2

Keywords

EUV Astronomy
EUV Lithography
Mo/Si multilayers

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10.1117/12.616902

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Louis, E., Yakshin, A. E., Zoethout, E., Van De Kruijs, R. W. E., Nedelcu, I., Van Der Westen, S. A., Tsarfati, T., Bijkerk, F., Enkisch, H., Müllender, S., Wolschrijn, B., & Mertens, B. (2005). Enhanced performance of EUV multilayer coatings. Proceedings of SPIE - the international society for optical engineering, 5900, 1-4. [590002]. https://doi.org/10.1117/12.616902

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abstract = "Reported is a summary of the development of EUV Mo/Si multilayer coating technology. Though the results are developed for application in Extreme Ultraviolet Lithography, they are of a broader relevance including optics for astronomy. The coating process used consists of electron beam evaporation in combination with low energy ion beam smoothening. The radiation hardness of these coatings is discussed and methods to reduce the multilayer induced substrate stress. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 65%, while the non correctable figure error added by the full multilayer stack is controlled to better than 15 picometer.",

keywords = "EUV Astronomy, EUV Lithography, Mo/Si multilayers",

author = "E. Louis and Yakshin, {A. E.} and E. Zoethout and {Van De Kruijs}, {R. W.E.} and I. Nedelcu and {Van Der Westen}, {S. Alonso} and T. Tsarfati and F. Bijkerk and H. Enkisch and S. M{\"u}llender and B. Wolschrijn and B. Mertens",

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Enhanced performance of EUV multilayer coatings. / Louis, E.; Yakshin, A. E.; Zoethout, E.; Van De Kruijs, R. W.E.; Nedelcu, I.; Van Der Westen, S. Alonso; Tsarfati, T.; Bijkerk, F.; Enkisch, H.; Müllender, S.; Wolschrijn, B.; Mertens, B.

In: Proceedings of SPIE - the international society for optical engineering, Vol. 5900, 590002, 01.12.2005, p. 1-4.

Research output: Contribution to journal › Conference article › Academic › peer-review

TY - JOUR

T1 - Enhanced performance of EUV multilayer coatings

AU - Louis, E.

AU - Yakshin, A. E.

AU - Zoethout, E.

AU - Van De Kruijs, R. W.E.

AU - Nedelcu, I.

AU - Van Der Westen, S. Alonso

AU - Tsarfati, T.

AU - Bijkerk, F.

AU - Enkisch, H.

AU - Müllender, S.

AU - Wolschrijn, B.

AU - Mertens, B.

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Y1 - 2005/12/1

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AB - Reported is a summary of the development of EUV Mo/Si multilayer coating technology. Though the results are developed for application in Extreme Ultraviolet Lithography, they are of a broader relevance including optics for astronomy. The coating process used consists of electron beam evaporation in combination with low energy ion beam smoothening. The radiation hardness of these coatings is discussed and methods to reduce the multilayer induced substrate stress. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 65%, while the non correctable figure error added by the full multilayer stack is controlled to better than 15 picometer.

KW - EUV Astronomy

KW - EUV Lithography

KW - Mo/Si multilayers

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DO - 10.1117/12.616902

M3 - Conference article

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JO - Proceedings of SPIE - the international society for optical engineering

JF - Proceedings of SPIE - the international society for optical engineering

SN - 0277-786X

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T2 - Optics for EUV, X-Ray, and Gamma-Ray Astronomy II 2005

Y2 - 3 August 2005 through 4 August 2005

ER -

Enhanced performance of EUV multilayer coatings

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