Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition

A. E. Yakshin, R. W E Van De Kruijs, I. Nedelcu, E. Zoethout, E. Louis, F. Bijkerk, H. Enkisch, S. Müllender

Research output: Contribution to journalConference articleAcademicpeer-review

33 Citations (Scopus)

Abstract

A new deposition technique that builds on the thermal particle characteristics typical for e-beam deposition is described. This technique applies magnetron sputtering in a special scheme where these characteristics of the e-beam deposition method are achieved. The method was used for interface engineering of Mo/Si multilayers, with different barrier layer materials being tested. Composition of the barrier layers formed was studied using XPS. Results are shown on the general example of a Mo/B4C/Si/B4C system. The ultra-thin reflectance enhancement B4C barriers can be deposited with low added stress, resulting in a multilayer stress as low as about -150 MPa. The best interface engineered multilayers reflect 70.5% at 13.3 nm and 70.15% at 13.5 nm. These results were achieved with 50 period multilayers terminated with a standard Si layer.

Original languageEnglish
Article number65170I
JournalProceedings of SPIE - the international society for optical engineering
Volume6517
Issue numberPART 1
DOIs
Publication statusPublished - 15 Oct 2007
Externally publishedYes
EventEmerging Lithographic Technologies XI 2007 - San Jose, United States
Duration: 27 Feb 20071 Mar 2007

Fingerprint

Reflectance
Multilayer
Multilayers
barrier layers
reflectance
Electron Beam
Magnetron Sputtering
magnetron sputtering
engineering
Magnetron sputtering
X ray photoelectron spectroscopy
augmentation
Enhancement
Engineering
Hot Temperature
Chemical analysis

Keywords

  • BC
  • Barrier
  • Deposition
  • Diffusion
  • EUV
  • Interface
  • Mo
  • Multilayer
  • Reflectance
  • Si
  • Stress

Cite this

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title = "Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition",
abstract = "A new deposition technique that builds on the thermal particle characteristics typical for e-beam deposition is described. This technique applies magnetron sputtering in a special scheme where these characteristics of the e-beam deposition method are achieved. The method was used for interface engineering of Mo/Si multilayers, with different barrier layer materials being tested. Composition of the barrier layers formed was studied using XPS. Results are shown on the general example of a Mo/B4C/Si/B4C system. The ultra-thin reflectance enhancement B4C barriers can be deposited with low added stress, resulting in a multilayer stress as low as about -150 MPa. The best interface engineered multilayers reflect 70.5{\%} at 13.3 nm and 70.15{\%} at 13.5 nm. These results were achieved with 50 period multilayers terminated with a standard Si layer.",
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Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition. / Yakshin, A. E.; Van De Kruijs, R. W E; Nedelcu, I.; Zoethout, E.; Louis, E.; Bijkerk, F.; Enkisch, H.; Müllender, S.

In: Proceedings of SPIE - the international society for optical engineering, Vol. 6517, No. PART 1, 65170I, 15.10.2007.

Research output: Contribution to journalConference articleAcademicpeer-review

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AU - Yakshin, A. E.

AU - Van De Kruijs, R. W E

AU - Nedelcu, I.

AU - Zoethout, E.

AU - Louis, E.

AU - Bijkerk, F.

AU - Enkisch, H.

AU - Müllender, S.

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