Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment

E. Louis*, H.J. Voorma, N.B. Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Yu Ya Platonov, G.E. van Dorssen, H. A. Padmore

*Corresponding author for this work

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Abstract

In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for λ = 13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.

Original languageEnglish
Pages (from-to)215-218
Number of pages4
JournalMicroelectronic engineering
Volume23
Issue number1-4
DOIs
Publication statusPublished - Jan 1994
Externally publishedYes

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