Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment

E. Louis; H.J. Voorma; N.B. Koster; L. Shmaenok; F. Bijkerk; R. Schlatmann; J. Verhoeven; Yu Ya Platonov; G.E. van Dorssen; H. A. Padmore

doi:10.1016/0167-9317(94)90140-6

Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment

E. Louis^*, H.J. Voorma, N.B. Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Yu Ya Platonov, G.E. van Dorssen, H. A. Padmore

^*Corresponding author for this work

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Abstract

In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for λ = 13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.

Original language	English
Pages (from-to)	215-218
Number of pages	4
Journal	Microelectronic engineering
Volume	23
Issue number	1-4
DOIs	https://doi.org/10.1016/0167-9317(94)90140-6
Publication status	Published - Jan 1994
Externally published	Yes

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Louis, E., Voorma, H. J., Koster, N. B., Shmaenok, L., Bijkerk, F., Schlatmann, R., Verhoeven, J., Platonov, Y. Y., van Dorssen, G. E., & Padmore, H. A. (1994). Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment. Microelectronic engineering, 23(1-4), 215-218. https://doi.org/10.1016/0167-9317(94)90140-6

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title = "Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment",

abstract = "In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for λ = 13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.",

author = "E. Louis and H.J. Voorma and N.B. Koster and L. Shmaenok and F. Bijkerk and R. Schlatmann and J. Verhoeven and Platonov, {Yu Ya} and {van Dorssen}, G.E. and Padmore, {H. A.}",

year = "1994",

month = jan,

doi = "10.1016/0167-9317(94)90140-6",

language = "English",

volume = "23",

pages = "215--218",

journal = "Microelectronic engineering",

issn = "0167-9317",

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Louis, E, Voorma, HJ, Koster, NB, Shmaenok, L, Bijkerk, F, Schlatmann, R, Verhoeven, J, Platonov, YY, van Dorssen, GE & Padmore, HA 1994, 'Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment', Microelectronic engineering, vol. 23, no. 1-4, pp. 215-218. https://doi.org/10.1016/0167-9317(94)90140-6

TY - JOUR

T1 - Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment

AU - Louis, E.

AU - Voorma, H.J.

AU - Koster, N.B.

AU - Shmaenok, L.

AU - Bijkerk, F.

AU - Schlatmann, R.

AU - Verhoeven, J.

AU - Platonov, Yu Ya

AU - van Dorssen, G.E.

AU - Padmore, H. A.

PY - 1994/1

Y1 - 1994/1

N2 - In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for λ = 13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.

AB - In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for λ = 13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.

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U2 - 10.1016/0167-9317(94)90140-6

DO - 10.1016/0167-9317(94)90140-6

M3 - Article

AN - SCOPUS:0028322842

SN - 0167-9317

VL - 23

SP - 215

EP - 218

JO - Microelectronic engineering

JF - Microelectronic engineering

IS - 1-4

ER -

Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment

Abstract

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