Epitaxial thin films grown by pulsed laser deposition

David H.A. Blank

doi:10.1109/CLEOE.2005.1568075

Epitaxial thin films grown by pulsed laser deposition

David H.A. Blank

Research output: Contribution to conference › Paper

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Abstract

In this paper, we present the pulsed laser deposition (PLD) technique to control the growth of metal oxide materials at atomic level using high-pressure reflective high-energy electron diffraction and ellipsometry. These developments have helped to make PLD a grown-up technique to fabricate complex materials and structures

Original language	Undefined
Pages	291-291
DOIs	https://doi.org/10.1109/CLEOE.2005.1568075
Publication status	Published - 2005
Event	European Conference on Lasers and Electro-Optics, CLEO/Europe 2005 - International Congress Centre Munich, Munchen, Germany Duration: 12 Jun 2005 → 17 Jun 2005 Conference number: 17

Conference

Conference	European Conference on Lasers and Electro-Optics, CLEO/Europe 2005
Abbreviated title	CLEO/Europe
Country/Territory	Germany
City	Munchen
Period	12/06/05 → 17/06/05

Keywords

IR-55784

Access to Document

10.1109/CLEOE.2005.1568075

01568075

Cite this

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title = "Epitaxial thin films grown by pulsed laser deposition",

abstract = "In this paper, we present the pulsed laser deposition (PLD) technique to control the growth of metal oxide materials at atomic level using high-pressure reflective high-energy electron diffraction and ellipsometry. These developments have helped to make PLD a grown-up technique to fabricate complex materials and structures",

keywords = "IR-55784",

author = "Blank, {David H.A.}",

year = "2005",

doi = "10.1109/CLEOE.2005.1568075",

language = "Undefined",

pages = "291--291",

note = "European Conference on Lasers and Electro-Optics, CLEO/Europe 2005 ; Conference date: 12-06-2005 Through 17-06-2005",

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TY - CONF

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AU - Blank, David H.A.

N1 - Conference code: 17

PY - 2005

Y1 - 2005

N2 - In this paper, we present the pulsed laser deposition (PLD) technique to control the growth of metal oxide materials at atomic level using high-pressure reflective high-energy electron diffraction and ellipsometry. These developments have helped to make PLD a grown-up technique to fabricate complex materials and structures

AB - In this paper, we present the pulsed laser deposition (PLD) technique to control the growth of metal oxide materials at atomic level using high-pressure reflective high-energy electron diffraction and ellipsometry. These developments have helped to make PLD a grown-up technique to fabricate complex materials and structures

KW - IR-55784

U2 - 10.1109/CLEOE.2005.1568075

DO - 10.1109/CLEOE.2005.1568075

M3 - Paper

SP - 291

EP - 291

T2 - European Conference on Lasers and Electro-Optics, CLEO/Europe 2005

Y2 - 12 June 2005 through 17 June 2005

ER -