Estimation of refractive index profiles of vertically aligned disordered silicon nanowires for photon management applications

Sudhir Kumar Saini, Rajesh V. Nair

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

We discuss a promising method to assess the refractive index profile of vertically aligned disordered Silicon nanowire arrays. The aberration-free micro-reflectivity set-up equipped with an in-situ optical microscope is designed to measure the reflectivity from 4μm2 area of the nanowires. The spatial- and polarization-dependent reflectivity values along the nanowire length is used to estimate the refractive index profile. The transfer matrix method involving the estimated refractive index profiles is employed to corroborate the measured reflectivity values. The disordered Silicon nanowires with gradient refractive index profile can suppress 96 % reflectivity irrespective of direction, wavelength, and polarization which make them a potential candidate for photon management applications.

Original languageEnglish
Title of host publicationSPIE Micro + Nano Materials, Devices, and Applications 2019
EditorsM. Cather Simpson, Saulius Juodkazis
PublisherSPIE
ISBN (Electronic)9781510631427
DOIs
Publication statusPublished - 2019
Externally publishedYes
EventSPIE Micro + Nano Materials, Devices, and Applications 2019 - Melbourne, Australia
Duration: 9 Dec 201912 Dec 2019

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume11201
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceSPIE Micro + Nano Materials, Devices, and Applications 2019
Country/TerritoryAustralia
CityMelbourne
Period9/12/1912/12/19

Keywords

  • Antireflection nanostructures
  • Gradient refractive index
  • Silicon nanowires
  • Subwavelength photonic structures

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