Etching technology for microchannels

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

38 Citations (Scopus)
470 Downloads (Pure)

Abstract

Various ways of fabricating channels in silicon are discussed. Some new channels are presented: the GPSIC's and the LPCVD covered channels. Also some attention is paid to the problem of making connections of these channels to the outside world.
Original languageUndefined
Title of host publicationProceedings of the 1997 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS
Place of PublicationPiscataway
PublisherIEEE Computer Society
Pages147-152
Number of pages6
ISBN (Print)0-7803-3744-1
DOIs
Publication statusPublished - 26 Jan 1997
Event10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS 1997 - Nagoya, Japan
Duration: 26 Jan 199730 Jan 1997
Conference number: 10

Publication series

Name
PublisherIEEE

Workshop

Workshop10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS 1997
Abbreviated titleMEMS
CountryJapan
CityNagoya
Period26/01/9730/01/97

Keywords

  • METIS-112885
  • EWI-13495
  • IR-16003

Cite this

Tjerkstra, R. W., de Boer, M. J., Berenschot, J. W., Gardeniers, J. G. E., van den Berg, A., & Elwenspoek, M. C. (1997). Etching technology for microchannels. In Proceedings of the 1997 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS (pp. 147-152). Piscataway: IEEE Computer Society. https://doi.org/10.1109/MEMSYS.1997.581790
Tjerkstra, R.W. ; de Boer, Meint J. ; Berenschot, Johan W. ; Gardeniers, Johannes G.E. ; van den Berg, Albert ; Elwenspoek, Michael Curt. / Etching technology for microchannels. Proceedings of the 1997 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS. Piscataway : IEEE Computer Society, 1997. pp. 147-152
@inproceedings{c698b744e5154af7a9fab8c02024f54a,
title = "Etching technology for microchannels",
abstract = "Various ways of fabricating channels in silicon are discussed. Some new channels are presented: the GPSIC's and the LPCVD covered channels. Also some attention is paid to the problem of making connections of these channels to the outside world.",
keywords = "METIS-112885, EWI-13495, IR-16003",
author = "R.W. Tjerkstra and {de Boer}, {Meint J.} and Berenschot, {Johan W.} and Gardeniers, {Johannes G.E.} and {van den Berg}, Albert and Elwenspoek, {Michael Curt}",
year = "1997",
month = "1",
day = "26",
doi = "10.1109/MEMSYS.1997.581790",
language = "Undefined",
isbn = "0-7803-3744-1",
publisher = "IEEE Computer Society",
pages = "147--152",
booktitle = "Proceedings of the 1997 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS",
address = "United States",

}

Tjerkstra, RW, de Boer, MJ, Berenschot, JW, Gardeniers, JGE, van den Berg, A & Elwenspoek, MC 1997, Etching technology for microchannels. in Proceedings of the 1997 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS. IEEE Computer Society, Piscataway, pp. 147-152, 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS 1997, Nagoya, Japan, 26/01/97. https://doi.org/10.1109/MEMSYS.1997.581790

Etching technology for microchannels. / Tjerkstra, R.W.; de Boer, Meint J.; Berenschot, Johan W.; Gardeniers, Johannes G.E.; van den Berg, Albert; Elwenspoek, Michael Curt.

Proceedings of the 1997 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS. Piscataway : IEEE Computer Society, 1997. p. 147-152.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Etching technology for microchannels

AU - Tjerkstra, R.W.

AU - de Boer, Meint J.

AU - Berenschot, Johan W.

AU - Gardeniers, Johannes G.E.

AU - van den Berg, Albert

AU - Elwenspoek, Michael Curt

PY - 1997/1/26

Y1 - 1997/1/26

N2 - Various ways of fabricating channels in silicon are discussed. Some new channels are presented: the GPSIC's and the LPCVD covered channels. Also some attention is paid to the problem of making connections of these channels to the outside world.

AB - Various ways of fabricating channels in silicon are discussed. Some new channels are presented: the GPSIC's and the LPCVD covered channels. Also some attention is paid to the problem of making connections of these channels to the outside world.

KW - METIS-112885

KW - EWI-13495

KW - IR-16003

U2 - 10.1109/MEMSYS.1997.581790

DO - 10.1109/MEMSYS.1997.581790

M3 - Conference contribution

SN - 0-7803-3744-1

SP - 147

EP - 152

BT - Proceedings of the 1997 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS

PB - IEEE Computer Society

CY - Piscataway

ER -

Tjerkstra RW, de Boer MJ, Berenschot JW, Gardeniers JGE, van den Berg A, Elwenspoek MC. Etching technology for microchannels. In Proceedings of the 1997 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS. Piscataway: IEEE Computer Society. 1997. p. 147-152 https://doi.org/10.1109/MEMSYS.1997.581790