Etching technology for microchannels

R.W. Tjerkstra, Meint J. de Boer, Johan W. Berenschot, Johannes G.E. Gardeniers, Albert van den Berg, Michael Curt Elwenspoek

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

39 Citations (Scopus)
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Abstract

Various ways of fabricating channels in silicon are discussed. Some new channels are presented: the GPSIC's and the LPCVD covered channels. Also some attention is paid to the problem of making connections of these channels to the outside world.
Original languageUndefined
Title of host publicationProceedings of the 1997 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS
Place of PublicationPiscataway
PublisherIEEE Computer Society
Pages147-152
Number of pages6
ISBN (Print)0-7803-3744-1
DOIs
Publication statusPublished - 26 Jan 1997
Event10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS 1997 - Nagoya, Japan
Duration: 26 Jan 199730 Jan 1997
Conference number: 10

Publication series

Name
PublisherIEEE

Workshop

Workshop10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS 1997
Abbreviated titleMEMS
CountryJapan
CityNagoya
Period26/01/9730/01/97

Keywords

  • METIS-112885
  • EWI-13495
  • IR-16003

Cite this

Tjerkstra, R. W., de Boer, M. J., Berenschot, J. W., Gardeniers, J. G. E., van den Berg, A., & Elwenspoek, M. C. (1997). Etching technology for microchannels. In Proceedings of the 1997 10th Annual International Workshop on Micro Electro Mechanical Systems, MEMS (pp. 147-152). Piscataway: IEEE Computer Society. https://doi.org/10.1109/MEMSYS.1997.581790